P04000 - SEMI P40 - 極紫外線 リソグラフィマスクの取り付けに関する要求条件およびアライメント基準位置の仕様

SEMI P40 - 極紫外線 リソグラフィマスクの取り付けに関する要求条件およびアライメント基準位置の仕様 -

Member Price: ₩135
Non-Member Price: ₩347,000

Volume(s): Microlithography
Language: Japanese

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Type: Single Standards Download (.pdf)

개정: SEMI P40-1103 - 대체됨

개정

Abstract

本stanダードは, Global Micropatterning Committeeで技術的に承認されたもので, North American Micropatterning Committeeが直接責任を負うものである.現版は, 2003 년 93 일 North American Regional Standards Committee 에にて承認されている。 2003年9 月にまずwww.semi.org で入手可能になり， 2003 年11 月発行に至る。

この仕様は，極紫外線リソグラフィ( EUVL )のmaskの取り付けに関する要求条件について記載する.

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