P03700 - SEMI P37 - 極紫外線 リソグラフィマスク基板の仕様

SEMI P37 - 極紫外線 リソグラフィマスク基板の仕様 -

Member Price: ₩135
Non-Member Price: ₩315,000

Volume(s): Microlithography
Language: Japanese

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Type: Single Standards Download (.pdf)

개정: SEMI P37-1102 - 대체됨

개정

Abstract

本stanダードは， Global Micropatterning Committeeで技術的に承認されたもので， North American Micropatterning Committeeが直接責任を負うものである。現版は， 200 2年829日North American Regional Standards Committee に承認사 레타 。 200 2年9月にまずwww.semi.org で入手可能となり， 200 2 年11 月発行に至る。 初版は2001 年11 月。

 

本仕様は，極紫外線リソグラフィ( EUVL )mask用の基板に関する一般的要求条件を記述している.

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