{"product_id":"f12100-semi-f121-guide-for-evaluating-metrology-for-particle-precursors-in-ultrapure-water-1","title":"F12100 - SEMI F121 - Guide for Evaluating Metrology for Particle Precursors in Ultrapure Water","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eThis Guide provides a performance-based definition of metrology that can be used to measure particle precursors in ultrapure water (UPW). This Guide includes a testing methodology and criteria for qualifying measurement techniques for quantifying particle precursor concentrations in UPW. Particle precursors are defined as dissolved compounds that can form particles when dried on a wafer surface. This definition was developed by the UPW International Roadmap for Devices and Systems (IRDS). Particle precursors can originate from UPW system components, such as ion exchange resin (IX resin).\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eCritical dimensions in semiconductor manufacturing have reached levels susceptible to particle sizes and types that are currently difficult to detect. Particle precursors can form particles at those sizes, as demonstrated by a recent IRDS study. The industry requires proactive measures to prevent contamination and risk to yield, and, therefore, this Guide was developed to address the gap in metrology available for measurement of particle precursors.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eThis Guide recommends a testing methodology to qualify metrology for the measurement of particle precursors in UPW. Performance criteria include:\u003c\/span\u003e\u003c\/p\u003e\u003cul\u003e\n\u003cli\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eAccuracy in particle sizing,\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eRepeatability in particle sizing and concentration,\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eDynamic range, and\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eNoise.\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003ePerformance criteria testing materials include:\u003c\/span\u003e\u003c\/p\u003e\u003cul\u003e\n\u003cli\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eA traceable reference nanomaterial standard used for particle sizing validation,\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eA dissolved standard for concentration calibration, noise, and dynamic range, and\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eA real-world demonstration using IX resin extract to evaluate particle formation from a known particle precursor source relevant to the semiconductor industry.\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eTest procedures and success criteria are applicable to both online and offline sample measurement techniques.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eA key assumption of this Guide is that one step in the analytical process is a drying step, such as nebulization or atomization, to form a particle from a dissolved species.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eThe intended users of this Guide are instrument manufacturers and instrument users. The number of replicates and duration of performance criteria testing are provided in the Guide as recommended minimum values. However, instrument manufacturers can choose to run additional replicates over an extended period of time to further demonstrate instrument capabilities and performance.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI C93 — Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water System\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI F63 — Guide for Ultrapure Water Used in Semiconductor Processing\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI F121-0923 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI F121-0923 - Current","offer_id":43106843492419,"sku":"17123","price":380.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/FVolume_2571c901-0b2d-4d3b-a833-c6555fcbeb17.png?v=1776701099","url":"https:\/\/store-dev2.semi.org\/products\/f12100-semi-f121-guide-for-evaluating-metrology-for-particle-precursors-in-ultrapure-water-1","provider":"SEMI Dev 2","version":"1.0","type":"link"}