{"product_id":"f03500-semi-f35-test-method-for-ultra-high-purity-gas-distribution-system-integration-verification-using-non-invasive-oxygen-measurement","title":"F03500 - SEMI F35 - Test Method for Ultra-High Purity Gas Distribution System Integration Verification Using Non-Invasive Oxygen Measurement","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis test method was technically approved by the Global Gases Committee and is the direct responsibility of the North American Gases Committee. Current edition approved by the North American Regional Standards Committee on December 4, 2003. Initially available at www.semi.org February 2004; to be published March 2004. Originally published September 1998. \u003c\/p\u003e\u003cfont size=\"2\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Arial\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis test method defines a procedure to monitor the integrity of ultra-high purity (UHP) gas distribution systems by detecting the ingress of atmospheric oxygen. This test method would be used to evaluate an \"active\" UHP gas distribution system on a continuous basis by using \u003ci\u003enon-invasive\u003c\/i\u003e O\u003csub\u003e2\u003c\/sub\u003e measurement, without requiring an interruption of the process tools using the UHP gases of interest.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis test method should be used to protect semiconductor fabrication processes using the UHP gases, which may be sensitive to contamination by any of the common atmospheric impurities, such as N\u003csub\u003e2\u003c\/sub\u003e, O\u003csub\u003e2\u003c\/sub\u003e, H\u003csub\u003e2\u003c\/sub\u003eO, CO\u003csub\u003e2\u003c\/sub\u003e, before product yield problems develop.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis is the first such test method that describes a noninvasive leak detection and locating procedure. It differs from SEMI F1, which is an invasive technique for identifying leak sources using a mass spectrometer and a helium tracer gas.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis test method applies to UHP gas distribution systems used in semiconductor manufacturing facilities and comparable research and development areas.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis test method applies to bulk gas distribution systems carrying UHP gases such as N\u003csub\u003e2\u003c\/sub\u003e, Ar, He, H\u003csub\u003e2\u003c\/sub\u003e, N\u003csub\u003e2\u003c\/sub\u003eO, SF\u003csub\u003e6\u003c\/sub\u003e, and many halocarbons. In most cases, O\u003csub\u003e2\u003c\/sub\u003e is present only in ultra-low trace levels (typically less than 1.0 ppb).\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis test method will provide real-time monitoring of UHP gas distribution systems, resulting in meaningful system integrity verification, atmospheric contaminant trending analysis, and leak locating.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis test method will provide the user with sufficient information to identify and troubleshoot sources of atmospheric leakage into the UHP gas distribution system.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis test method includes the specification of the required O\u003csub\u003e2\u003c\/sub\u003e analytical equipment, standard methods for proper use of the O\u003csub\u003e2\u003c\/sub\u003e analytical equipment, and manipulation of the O\u003csub\u003e2\u003c\/sub\u003e data in identifying atmospheric leak sources.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\n\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eSEMI F1 — Specification for Leak Integrity of HighPurity Gas Piping Systems and Components\u003c\/font\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/font\u003e","brand":"semi.org","offers":[{"title":"SEMI F35-0304 - Inactive","offer_id":40234344972355,"sku":"11015","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI F35-0998 - Superseded","offer_id":40234344939587,"sku":"10949","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/FVolume_22aad921-b693-449a-97ce-c66af0825e37.png?v=1776702246","url":"https:\/\/store-dev2.semi.org\/products\/f03500-semi-f35-test-method-for-ultra-high-purity-gas-distribution-system-integration-verification-using-non-invasive-oxygen-measurement","provider":"SEMI Dev 2","version":"1.0","type":"link"}