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1910 products

P03400 - SEMI P34 - Specification for 230 mm Square Photomask Substrates
SEMI P34 - Specification for 230 mm Square Photomask Substrates Sale priceMember Price: €113,00
Non-Member Price: €171,95
P03500 - SEMI P35 - Terminology for Microlithography Metrology
SEMI P35 - Terminology for Microlithography Metrology Sale priceMember Price: €113,00
Non-Member Price: €171,95
P03500 - SEMI P35 - マイクロリソグラフィメトロロジの用語法
SEMI P35 - マイクロリソグラフィメトロロジの用語法 Sale priceMember Price: €135,00
Non-Member Price: €205,95
P03600 - SEMI P36 - Guide for Magnification Reference for Critical Dimension Measurement Scanning Electron Microscopes (CD-SEM)
P03600 - SEMI P36 - 測長走査型電子顕微鏡(CD-SEM)用倍率標準試料のガイド
SEMI P36 - 測長走査型電子顕微鏡(CD-SEM)用倍率標準試料のガイド Sale priceMember Price: €135,00
Non-Member Price: €205,95
P03700 - SEMI P37 - Specification for Extreme Ultraviolet Lithography Substrates and Blanks
SEMI P37 - Specification for Extreme Ultraviolet Lithography Substrates and Blanks Sale priceMember Price: €113,00
Non-Member Price: €171,95
P03700 - SEMI P37 - 極紫外線リソグラフィマスク基板の仕様
SEMI P37 - 極紫外線リソグラフィマスク基板の仕様 Sale priceMember Price: €135,00
Non-Member Price: €205,95
P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard - SEMI Dev 2
P03900 - SEMI P39 - OASISTM – オープン・アートワーク・システム・インターチェンジ・スタンダード(OPEN ARTWORK SYSTEM INTERCHANGE STANDARD)
P03900 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard
P04000 - SEMI P40 - Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks
SEMI P40 - Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks Sale priceMember Price: €113,00
Non-Member Price: €171,95
P04000 - SEMI P40 - 極紫外線リソグラフィマスクの取り付けに関する要求条件およびアライメント基準位置の仕様
P04100 - SEMI P41 - Specification for Mask Defect Data Handling with XML, Between Defect Inspection Tools, Repair Tools, and Review Tools
P04100 - SEMI P41 - XMLによる,検査装置,修正装置およびレビュー装置間で取扱うマスク欠陥データ仕様
P04200 - SEMI P42 - Specification of Reticle Data for Automatic Recipe Transfer to Wafer Exposure System
P04200 - SEMI P42 - ウェーハ露光システムへの自動レシピ伝送のためのレチクルデータの仕様
P04300 - SEMI P43 - Photomask Qualification Terminology
SEMI P43 - Photomask Qualification Terminology Sale priceMember Price: €113,00
Non-Member Price: €171,95
P04400 - SEMI P44 - Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools
P04400 - SEMI P44 - マスク装置向けオープン・アートワーク・システム・インターチェンジ・スタンダード(OASIS®)の仕様
P04500 - SEMI P45 - Specification for Job Deck Data Format for Mask Tools
SEMI P45 - Specification for Job Deck Data Format for Mask Tools Sale priceMember Price: €113,00
Non-Member Price: €171,95
P04500 - SEMI P45 - マスク装置向けジョブデック・データフォーマットの仕様
SEMI P45 - マスク装置向けジョブデック・データフォーマットの仕様 Sale priceMember Price: €135,00
Non-Member Price: €205,95
P04600 - SEMI P46 - Specification for Critical Dimension (CD) Measurement Information Data on Photomask by XML
P04600 - SEMI P46 - XMLによるフォトマスクのCD計測情報データの仕様
SEMI P46 - XMLによるフォトマスクのCD計測情報データの仕様 Sale priceMember Price: €135,00
Non-Member Price: €205,95
P04700 - SEMI P47 - Test Method for Evaluation of Line-Edge Roughness and Linewidth Roughness
SEMI P47 - Test Method for Evaluation of Line-Edge Roughness and Linewidth Roughness Sale priceMember Price: €113,00
Non-Member Price: €171,95