{"product_id":"e19500-semi-e195-test-method-using-adhesive-replacement-substrates-to-assess-particulate-surface-contamination-on-critical-chamber-components","title":"E19500 - SEMI E195 - Test Method Using Adhesive Replacement Substrates to Assess Particulate Surface Contamination on Critical Chamber Components","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003e1  Purpose\u003cbr\u003e1.1  This Test Method describes a quantitative analysis method to measure the ISO 14644-9 surface cleanliness for particle concentration (SCP) of a critical chamber component (CCC) by means of an adhesive replacement substrate (ARS), which removes particles from the CCC surfaces of interest. The ARS is subsequently measured with a scanning surface inspection system (SSIS), typically a scatterometer, for particle counting, and with scanning electron microscopy with energy dispersive x-ray spectrometry (SEM\/EDX) to identify the elemental composition of the particles. \u003cbr\u003e1.2  This Test Method is intended to promote communication among the relevant parties (e.g., processing-equipment users, processing-equipment manufacturers, CCC manufacturers, cleaning-service providers, testing laboratories). This Test Method also can be used to facilitate better communication regarding particle-level expectations among the users, processing equipment manufacturers, the CCC manufacturers, and the cleaning-service providers.\u003cbr\u003e1.3  The intended use of this Test Method is to ensure consistency in the measuring and reporting of results provided by each processing-equipment manufacturer or CCC manufacturer.\u003cbr\u003e2  Scope\u003cbr\u003e2.1  This Test Method applies to the measurement of the ISO 14644-9 SCP of a CCC (e.g., showerheads, pedestals, weldments, optical housings) by means of an ARS.\u003c\/p\u003e\u003cp\u003e\u003cbr\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI E89 — Guide for Measurement System Analysis (MSA)\u003cbr\u003eSEMI F63 — Guide for Ultrapure Water Used in Semiconductor Processing\u003cbr\u003eSEMI M53 — Practice for Calibrating Scanning Surface Inspection Systems Using Certified Depositions of Monodisperse Reference Spheres on Unpatterned Semiconductor Wafer Surfaces\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI E195-0925 (first published)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI E195-0925 - Current","offer_id":43106830155843,"sku":"18740","price":290000.0,"currency_code":"KRW","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/EVolume_352ec2fc-4aa1-44a3-9565-76b4e1fddac3.png?v=1776700830","url":"https:\/\/store-dev2.semi.org\/en-kr\/products\/e19500-semi-e195-test-method-using-adhesive-replacement-substrates-to-assess-particulate-surface-contamination-on-critical-chamber-components","provider":"SEMI Dev 2","version":"1.0","type":"link"}