{"product_id":"e11400-semi-e114-test-method-for-rf-cable-assemblies-used-in-semiconductor-processing-equipment-rf-power-delivery-systems","title":"E11400 - SEMI E114 - Test Method for RF Cable Assemblies Used in Semiconductor Processing Equipment RF Power Delivery Systems","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eThe purpose of this Standard is to define a test method used to determine the electrical length, power losses, and characteristic impedance variation of RF cable assemblies used in RF power delivery systems for semiconductor processing equipment.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eThis Standard specifies the testing procedures and test equipment required for the following:\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eDetermining the electrical length of RF cable assemblies at the nominal operating frequency in terms of degrees of phase shift.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eDetermining the power dissipation (loss) in the RF cable assembly at the nominal operating frequency.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eVerifying the characteristic impedance of the RF cable assembly.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eThe primary focus for this Test Method is semiconductor processing equipment including, but not limited to, the following tool types:\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eDry etch equipment, and\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eFilm deposition equipment (chemical vapor deposition [CVD] and physical vapor deposition [PVD]).\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eThis Standard does not address any safety or performance issues related to RF emissions or electrical codes (e.g., Underwriter’s Laboratory, Inc. (UL), the National Electrical Code (NEC\u003c\/span\u003e\u003cspan style=\"font-family:Symbol;font-size:9.5pt;\"\u003eâ)\u003c\/span\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003e, Federal Communications Commission [FCC]). It is the responsibility of the users of this Standard to conform to the appropriate local codes and regulations as applied to this type of equipment, some of which are covered by Related Documents.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eNone.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eSEMI E114-0302E (Reapproved 0923)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eSEMI E114-0302E (Reapproved 0309)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eSEMI E114-0302E (editorial revision)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:9.5pt;'\u003eSEMI E114-0302 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI E114-0302E (Reapproved 0923) - Current","offer_id":43106904309827,"sku":"17153","price":290000.0,"currency_code":"KRW","in_stock":true},{"title":"SEMI E114-0302E (Reapproved 0616) - Superseded","offer_id":43106904342595,"sku":"3730","price":290000.0,"currency_code":"KRW","in_stock":true},{"title":"SEMI E114-0302E (Reapproved 0309) - Superseded","offer_id":40234268524611,"sku":"7469","price":290000.0,"currency_code":"KRW","in_stock":true},{"title":"SEMI E114-0302E - Superseded","offer_id":40234268753987,"sku":"7192","price":290000.0,"currency_code":"KRW","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/EVolume_e9e56340-6c4a-42ae-82b2-e8fe7ec02292.png?v=1776702893","url":"https:\/\/store-dev2.semi.org\/en-kr\/products\/e11400-semi-e114-test-method-for-rf-cable-assemblies-used-in-semiconductor-processing-equipment-rf-power-delivery-systems","provider":"SEMI Dev 2","version":"1.0","type":"link"}