{"product_id":"p04300-semi-p43-photomask-qualification-terminology","title":"P04300 - SEMI P43 - Photomask Qualification Terminology","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits \u0026amp; Reviews Subcommittee on May 13, 2011. Available at www.semiviews.org and www.semi.org in June 2011; originally published March 2004.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eNOTICE: This document was reapproved with minor editorial changes.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis standard defines a unique language in the field of specification for, and qualification of, photomasks for use in optical lithography within the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eAt present only the International Technology Roadmap for Semiconductors (ITRS) serves as a universally accepted working document on how to specify photomasks, however the definitions used are subject to interpretation. Different tool makers, mask makers and mask users are hindered in the communication with each other, as they first need to know and understand each other’s terminology. The lack of a common terminology complicates comparison of tools. A uniformly used, and universally accepted terminology, with a minimum of ambiguity, is required.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe definitions listed are for mask qualification, incorporating 3 possible types of value for a given qualification parameter:\u003c\/p\u003e \u003cul\u003e\n\u003ci\u003e \u003c\/i\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cli\u003e\u0026lt;(true) qualification parameter\u0026gt;, which would be the result of an ideal measurement of the total population of features of interest.\u003c\/li\u003e \u003cp\u003e\u003c\/p\u003e\n\u003ci\u003e \u003c\/i\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cli\u003e\u0026lt;measured qualification parameter\u0026gt;, the result of a given population of measurements. It is hereby mentioned that a measured value (for example the mean, the standard deviation, the range) is always subject to the sample size of the measured population and the measurement method. Therefore, both the sample size and the measurement method are mandatory information.\u003c\/li\u003e \u003cp\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cli\u003e\u0026lt;\u003ci\u003equalification parameter spec(ification)\u0026gt;\u003c\/i\u003e, the maximum or minimum value that may not be exceeded for the selected population of measurements which must be defined as mandatory information.\u003c\/li\u003e \u003cp\u003e\u003c\/p\u003e\n\u003c\/ul\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe first two types of value for a given parameter, the true and measured qualification parameters, will be defined in the present document.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe third parameter type, the parameter specification, will not be discussed here, since it is subject to the agreement between the individual parties of the mask qualification process.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eIn order to assist users, the major differences in recommended default values between this standard and the ITRS mask table definitions are noted where applicable.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003c\/p\u003e\u003cp class=\"StdsText\" style=\"MARGIN:\"\u003e\u003cspan style=\"FONT-FAMILY:\" arial\u003e\u003cfont\u003eSEMI P10 — Specification of Data Structures for Photomask Orders\u003co:p\u003e\u003c\/o:p\u003e\u003cbr\u003e \u003cp class=\"StdsText\" style=\"MARGIN:\"\u003e\u003cspan style=\"FONT-FAMILY:\" arial\u003e\u003cfont\u003eSEMI P19 — Specification for Metrology Pattern Cells for Integrated Circuit Manufacture\u003co:p\u003e\u003c\/o:p\u003e\u003cbr\u003e \u003cp class=\"StdsText\" style=\"MARGIN:\"\u003e\u003cspan style=\"FONT-FAMILY:\" arial\u003e\u003cfont\u003eSEMI P21 — Guidelines for Precision and Accuracy Expression for Mask Writing Equipment\u003co:p\u003e\u003c\/o:p\u003e\u003cbr\u003e \u003cp class=\"StdsText\" style=\"MARGIN:\"\u003e\u003cspan style=\"FONT-FAMILY:\" arial\u003e\u003cfont\u003eSEMI P22 — Guideline for Photomask Defect Classification and Size Definition\u003co:p\u003e\u003c\/o:p\u003e\u003cbr\u003e \u003cp class=\"StdsText\" style=\"MARGIN:\"\u003e\u003cspan style=\"FONT-FAMILY:\" arial\u003e\u003cfont\u003eSEMI P24 — CD Metrology Procedures\u003co:p\u003e\u003c\/o:p\u003e\u003cbr\u003e \u003cp class=\"StdsText\" style=\"MARGIN:\"\u003e\u003cspan style=\"FONT-FAMILY:\" arial\u003e\u003cfont\u003eSEMI P35 — Terminology for Microlithography Metrology\u003co:p\u003e\u003c\/o:p\u003e\u003cbr\u003e \u003cbr\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI P43-0304 (Reapproved 0611) - Inactive","offer_id":40234358669379,"sku":"11342","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI P43-0304 - Superseded","offer_id":40234358767683,"sku":"12987","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/PVolume_068c0566-7843-480f-a89e-9becc9450279.png?v=1776701945","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/p04300-semi-p43-photomask-qualification-terminology","provider":"SEMI Dev 2","version":"1.0","type":"link"}