{"product_id":"p03100-semi-p31-practice-for-catalog-publication-for-chemical-amplified-ca-photoresist-parameter","title":"P03100 - SEMI P31 - Practice for Catalog Publication for Chemical Amplified (CA) Photoresist Parameter","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 13, 2011. Available at www.semiviews.org and www.semi.org in June 2011; originally published September 1997; previously published March 2004.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eNOTICE: This Document was reapproved with minor editorial changes.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide a baseline for publication of chemical amplified (CA) photoresist parameters.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document applies to CA photoresist used for semiconductor manufacturing.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document is used as the guide to evaluate photoresist process parameters.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document is not applicable for quality assurance.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eNone.\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI P31-0304 (Reapproved 0611) - Inactive","offer_id":40234360995907,"sku":"11331","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI P31-0304 - Superseded","offer_id":40234361192515,"sku":"12966","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/PVolume_c530fb09-89df-4e7e-9cef-71f43f66ce55.png?v=1776701957","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/p03100-semi-p31-practice-for-catalog-publication-for-chemical-amplified-ca-photoresist-parameter","provider":"SEMI Dev 2","version":"1.0","type":"link"}