{"product_id":"p02900-semi-p29-specification-for-characteristics-specific-to-attenuated-phase-shift-masks-and-masks-blanks","title":"P02900 - SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks","description":"\u003cp class=\"StdsIndent\" style=\"MARGIN: 0in 0.5in 6pt\"\u003e\u003cspan style=\"font-family: Arial;\"\u003e\u003cfont size=\"2\"\u003e \u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e \u003cp class=\"StdsHead2\" style=\"margin: 6pt 0in;\"\u003e\u003cspan style=\"FONT-FAMILY: Arial\"\u003e\u003cfont size=\"2\"\u003eThis Specification covers the characteristics specific to attenuated phase shift masks and mask blanks.\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cfont style=\"\"\u003e\u003cfont size=\"2\"\u003e \u003c\/font\u003e\u003cp style=\"\"\u003e\u003cfont size=\"2\"\u003e \u003cfont face=\"arial\" style=\"\"\u003e　\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont face=\"arial\" style=\"\" size=\"2\"\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003c\/font\u003e\u003cp style=\"\"\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cspan style=\"FONT-FAMILY:\" arial=\"\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eSEMI P1 — Specification for Hard Surface Photomask Substrates\u003c!--?xml:namespace prefix = o ns = urn:schemas-microsoft-com:office:office \/--\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003cbr\u003e \u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cfont\u003e\u003cspan style=\"FONT-FAMILY:\" arial=\"\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eSEMI P2 — Specification for Chrome Thin Films for Hard Surface Photomasks\u003co:p\u003e\u003c\/o:p\u003e\u003cbr\u003e \u003c\/font\u003e\u003c\/span\u003e\u003c\/font\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cfont\u003e\u003cfont\u003e\u003cspan style=\"FONT-FAMILY:\" arial=\"\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eSEMI P22 — Guideline for Photomask Defect Classification and Size Definition\u003co:p\u003e\u003c\/o:p\u003e\u003cbr\u003e \u003c\/font\u003e\u003c\/span\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cfont style=\"\"\u003e\u003cfont style=\"\"\u003e\u003cfont style=\"\"\u003e\u003cspan style=\"\" arial=\"\"\u003e\u003cfont style=\"\"\u003e\u003cfont size=\"2\"\u003e\u003cfont face=\"arial\" style=\"\"\u003eSEMI P28 — Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture\u003c\/font\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003cbr\u003e\u003c\/font\u003e \u003cbr\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\u003c\/font\u003e","brand":"semi.org","offers":[{"title":"SEMI P29-1111 - Inactive","offer_id":40234319708227,"sku":"5234","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI P29-1105 - Superseded","offer_id":40234319904835,"sku":"12963","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI P29-0997 - Superseded","offer_id":40234320068675,"sku":"12962","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/PVolume_7f3963f8-8512-493d-a781-fdc3d33cc2b7.png?v=1776702502","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/p02900-semi-p29-specification-for-characteristics-specific-to-attenuated-phase-shift-masks-and-masks-blanks","provider":"SEMI Dev 2","version":"1.0","type":"link"}