{"product_id":"p02000-semi-p20-guideline-for-catalog-publication-of-eb-resist-parameters-proposal","title":"P02000 - SEMI P20 - Guideline for Catalog Publication of EB Resist Parameters (Proposal)","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis guideline was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on April 28, 2003. Initially available at www.semi.org June 2003; to be published July 2003. Originally published in 1992.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this guideline is to provide a baseline for publications of EB resist parameters. It can also be used as a guide to evaluate resist process parameters. This guideline is intended to be applicable for electron beam processes.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe parameters for EB Resist publication are discussed below.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eNone.\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI P20-0703 - Inactive","offer_id":40234360963139,"sku":"11309","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/PVolume_0ee2e56a-9743-4b62-baff-9c0e0e6be668.png?v=1776701974","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/p02000-semi-p20-guideline-for-catalog-publication-of-eb-resist-parameters-proposal","provider":"SEMI Dev 2","version":"1.0","type":"link"}