{"product_id":"p01400-semi-p14-determination-of-tin-in-positive-photoresists-by-graphite-furnace-atomic-absorption-spectroscopy","title":"P01400 - SEMI P14 - Determination of Tin in Positive Photoresists by Graphite Furnace Atomic Absorption Spectroscopy","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eThis procedure is a graphite furnace atomic absorption analytical method for tin in photoresist. The applicable concentration range is 0.1 to 1 ppm when the sample is diluted one to ten. The precision was found to be within 0.1 ppm in a round robin analysis between four laboratories.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eNone.\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI P14-0997 - Inactive","offer_id":40234359914563,"sku":"11297","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/PVolume_a6180729-fa9c-4e80-870a-f4aa6d058f14.png?v=1776701984","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/p01400-semi-p14-determination-of-tin-in-positive-photoresists-by-graphite-furnace-atomic-absorption-spectroscopy","provider":"SEMI Dev 2","version":"1.0","type":"link"}