{"product_id":"mf161800-semi-mf1618-practice-for-determination-of-uniformity-of-thin-films-on-silicon-wafers","title":"MF161800 - SEMI MF1618 - Practice for Determination of Uniformity of Thin Films on Silicon Wafers","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cbr\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eNOTICE: This Document was reapproved with minor editorial\nchanges.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe purpose of this Practice is to promote commonality of\napproach to the analysis of uniformity among all parties needing to generate or\nassess such information, including manufacturers of the basic test\ninstrumentation to be used.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Practice is intended for process control, research and\ndevelopment, and process equipment evaluation purposes. It is intended for the\nbenefit of semiconductor device and equipment manufacturers alike so that\nacquisition, reduction, and communication of thin film data is consistent among\nvarious parties who may need to concur on interpretation of the results of a\nthin film fabrication-process step.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Practice covers a set of site distribution patterns\nfor measuring the uniformity of a property of a thin film on a silicon wafer,\nas well as simple procedures for analyzing and reporting the results of those\nmeasurements.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Practice is intended for use as a template for the\nevaluation of the uniformity of intrinsic film properties such as thickness or\ncomposition, and also film functional characteristics such as sheet resistance\nand reflectivity. The resulting information may be used to assess the uniformity\nof the film itself or of the layer formation process. This Practice is not\ndirectly applicable to evaluating wafer-to-wafer or lot-to-lot variations.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Practice is intended for use with any thin film or\nlayer type, or formation technique, for which basic measurement instrumentation\nand capability exists that, is appropriate to the film parameter of interest.\nThis Practice is intended for layer growth and deposition techniques such as\nepitaxy, implantation, thermal and chemical vapor deposition (CVD) oxidation,\nand metallization, as well as for layer modification such as various means of\nlayer etching.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Practice is intended for use with all silicon wafer\nsizes and types when measuring uniformity of film properties and\ncharacteristics. This Practice describes measurement site patterns and\ndetermination of their spatial coordinates on the wafer, as well as the\nstatistics to be used when reducing the measurement data to determine\nuniformity. For each of the sampling plans, the exact number of measurement\nsites is chosen based on the size of the wafer being used, the desired spatial\nresolution of the measurement instrument, and whether maximal, or somewhat\nlesser information density is desired. However, in all such choices, the\npattern of measurement sites, the rules for selecting their coordinates on the\nwafer, and the statistical calculations of the results should remain consistent\nwith the procedures of this Practice.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Practice can be used with any measurement method,\nprocedure or instrumentation that can measure the needed film property or\ncharacteristic with sufficient precision and spatial resolution to reveal the\nneeded information on spatial nonuniformity of the film. This Practice does not\nitself contain details on performing any specific measurement.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eNot all types of measurements that may need to be used for\nevaluation of the uniformity of a thin film have formal procedural standards.\nSEMI MF374, SEMI MF576, SEMI MF1392, SEMI MF1393, and SEMI MF1529 give details\nof measurement procedures that may be applied to evaluating the uniformity of\nthin film properties.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Practice does not deal with acquisition or analysis of\nuniformity data where it is desired to take more than one measurement per\nspecified spatial cell such as is commonly done for wafer site flatness\nmeasurements.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Practice makes no recommendations regarding the\ninterpretation of the statistics that result from analysis of the data acquired\nwith regard to the goodness or badness of given values of the test statistic,\nnor does it make recommendations regarding decisions about the process cycle or\nequipment used to produce the thin film that was measured.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe principles of this Practice may be adapted to determine\nthe uniformity of bulk silicon wafer properties such as interstitial oxygen\ncontent and resistivity, but depending on the desired property and the chosen\nmeasurement technique, depth-dependent variations may be misinterpreted as\nlateral variations.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M1 — Specification for Polished Single Crystal Silicon\nWafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M20 — Practice for Establishing a Wafer Coordinate\nSystem\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M59 — Terminology for Silicon Technology\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF81 — Test Method for Measuring Radial Resistivity\nVariation on Silicon Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF374 — Test Method for Sheet Resistance of Silicon\nEpitaxial, Diffused, Polysilicon, and Ion-Implanted Layers Using an In-Line\nFour-Point Probe with the Single-Configuration Procedure\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF576 — Test Method for Measurement of Insulator\nThickness and Refractive Index on Silicon Substrates by Ellipsometry\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1392 — Test Method for Determining Net Carrier\nDensity Profiles in Silicon Wafers by Capacitance-Voltage Measurements with a\nMercury Probe\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1393 (Withdrawn 0705) — Test Method for Determining\nNet Carrier Density in Silicon Wafers by Miller Feedback Profiler Measurements\nwith a Mercury Probe\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1529 — Test Method for Sheet Resistance Uniformity\nEvaluation by In-line Four-Point Probe with the Dual-Configuration Procedure\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1618-1110 (Reapproved 0322)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1618-1110 (Reapproved 1115)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1618-1110 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1618-1104 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1618-02 (first SEMI publication)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI MF1618-1110 (Reapproved 0322) - Current","offer_id":40234300407875,"sku":"14950","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1618-1110 (Reapproved 1115) - Superseded","offer_id":40234300473411,"sku":"4938","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1618-1110 - Superseded","offer_id":40234300506179,"sku":"9875","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1618-1104 - Superseded","offer_id":40234300538947,"sku":"9874","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MFVolume_f572ed22-88cd-4220-a2c5-9bcc123e8095.png?v=1776702538","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/mf161800-semi-mf1618-practice-for-determination-of-uniformity-of-thin-films-on-silicon-wafers","provider":"SEMI Dev 2","version":"1.0","type":"link"}