{"product_id":"mf152900-semi-mf1529-test-method-for-sheet-resistance-uniformity-evaluation-by-in-line-four-point-probe-with-the-dual-configuration-procedure","title":"MF152900 - SEMI MF1529 - Test Method for Sheet Resistance Uniformity Evaluation by In-Line Four-Point Probe with the Dual-Configuration Procedure","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eThe sheet resistance of epitaxial, implanted, diffused or deposited films is an important materials acceptance and process control parameter. The uniformity across a wafer of the sheet resistance resulting from any of these processes is important for the equivalence of performance of devices or circuits made from various regions of the wafer.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eThis Test Method uses a four-point probe in a manner different from that of other ASTM methods for the measurement of the resistivity or sheet resistance of semiconductors. In this Test Method, two different ways (configurations) of connecting the probe pins to the electronics that supply current and measure voltage are used at each measurement location on the specimen. This use of a four-point probe is often referred to as ‘dual-configuration’ or as ‘configuration switched’ measurements.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eThis Test Method covers the direct measurement of the sheet resistance and its variation for all but the periphery (amounting to three probe separations) for circular conducting layers pertinent to silicon semiconductor technology. These layers may be fabricated on substrates of any diameter that is capable of being securely mounted on a prober stage.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI C19 — Specification for Acetone\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI C23 — Specification for Buffered Oxide Etchants\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI C41 — Specification and Guide for 2-Propanol\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M59 — Terminology for Silicon Technology\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI MF42 — Test Method for Conductivity Type of Extrinsic Semiconducting Materials\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI MF81 — Test Method for Measuring Radial Resistivity Variation on Silicon Wafers\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI MF84 — Test Method for Measuring Resistivity of Silicon Wafers with an In-line Four-Point Probe\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI MF374 — Test Method for Sheet Resistance of Silicon Epitaxial, Diffused, Polysilicon, and Ion-Implanted Layers Using an In-Line Four-Point Probe with the Single-Configuration Procedure\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1618 — Practice for Determination of Uniformity of Thin Films on Silicon Wafers\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1529-0923 (technical revision)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1529-1110 (Reapproved 0222)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1529-1110 (Reapproved 1115)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1529-1110 (technical revision)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1529-1104 (technical revision)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1529-02 (first SEMI publication)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI MF1529-0923 - Current","offer_id":43106889334851,"sku":"17137","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1529-1110 (Reapproved 0222) - Superseded","offer_id":43106889367619,"sku":"14888","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1529-1110 (Reapproved 1115) - Superseded","offer_id":40234289692739,"sku":"4932","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1529-1110 - Superseded","offer_id":40234289791043,"sku":"9854","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1529-1104 - Superseded","offer_id":40234289954883,"sku":"9853","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1529-02 - Superseded","offer_id":40234290151491,"sku":"9852","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MFVolume_830a7b3e-dce5-45a9-aad5-2e1f46ac57a4.png?v=1776702545","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/mf152900-semi-mf1529-test-method-for-sheet-resistance-uniformity-evaluation-by-in-line-four-point-probe-with-the-dual-configuration-procedure","provider":"SEMI Dev 2","version":"1.0","type":"link"}