{"product_id":"mf118800-semi-mf1188-test-method-for-interstitial-oxygen-content-of-silicon-by-infrared-absorption-with-short-baseline","title":"MF118800 - SEMI MF1188 - Test Method for Interstitial Oxygen Content of Silicon by Infrared Absorption With Short Baseline","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003eThis Test Method covers the determination of the interstitial oxygen content of single crystal silicon by measurement of an infrared absorption band at room temperature, using a short baseline drawn between 1040 cm1 and 1160 cm1 to reduce the uncertainties due to perturbations in the IR absorption at the end-point regions of longer baselines that arise from effects other than absorption by interstitial oxygen.  Use of the short baseline results in improved precision of the method.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eThis Test Method requires the use of a computerized spectrophotometer, preferably a Fourier transform infrared (FT-IR) spectrophotometer. This method is incorporated into many modern FT-IR instruments.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eThis Test Method requires the use of an oxygen-free reference specimen.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eIt is recommended that a reference material set, such as NIST SRM  2551, another certified reference material set for oxygen content of silicon,  or reference materials traceable to the certified reference materials (CRMs), be used to calibrate the spectrophotometer in order to reduce bias.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eThe useful range of oxygen concentration measurable by this Test Method is from 1 atoms\/cm3 × 1016 atoms\/cm3 to the maximum amount of interstitial oxygen soluble in silicon.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eIf the spectrophotometer is calibrated using 2 mm thick double side polished CRMs, this Test Method is suitable for use only with 2 mm thick, double side polished test specimens. It can be extended to the measurement of test specimens polished on one or both sides with thickness in the range 0.4 mm to 4 mm with the use of working reference materials traceable to the double side polished CRMs.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eThe oxygen concentration obtained using this Test Method assumes a linear relationship between the interstitial oxygen concentration and the absorption coefficient of the 1107 cm1 band associated with interstitial oxygen in silicon.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eThe recommended calibration factor to convert absorption at 1107 cm1 to oxygen content is IOC-88, which is based on the analysis of the international GRR experiment.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI C29 — Specification and Guide for 4.9% Hydrofluoric Acid 10:1 v\/v\u003cbr\u003eSEMI M44 — Guide to Conversion Factors for Interstitial Oxygen in Silicon\u003cbr\u003eSEMI M59 — Terminology for Silicon Technology\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI MF1188-1107 (Reapproved 1123)\u003cbr\u003eSEMI MF1188-1107 (Reapproved 0718)\u003cbr\u003eSEMI MF1188-1107 (Reapproved 0912)\u003cbr\u003eSEMI MF1188-1107 (technical revision)\u003cbr\u003eSEMI MF1188-1105 (technical revision)\u003cbr\u003eSEMI MF1188-0305 (technical revision)\u003cbr\u003eSEMI MF1188-02 (first SEMI publication)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI MF1188-1107 (Reapproved 1123) - Current","offer_id":43106890350659,"sku":"17241","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1188-1107 (Reapproved 0718) - Superseded","offer_id":43106890383427,"sku":"4921","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1188-1107 (Reapproved 0912) - Superseded","offer_id":40234308010051,"sku":"9810","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1188-1107 - Superseded","offer_id":40234308042819,"sku":"9809","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1188-1105 - Superseded","offer_id":40234308075587,"sku":"9808","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1188-0305 - Superseded","offer_id":40234308108355,"sku":"9807","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1188-02 - Superseded","offer_id":40234308141123,"sku":"9806","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MFVolume_895c1a34-f408-4905-8cfc-37b19d62f661.png?v=1776702565","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/mf118800-semi-mf1188-test-method-for-interstitial-oxygen-content-of-silicon-by-infrared-absorption-with-short-baseline","provider":"SEMI Dev 2","version":"1.0","type":"link"}