{"product_id":"mf104900-semi-mf1049-practice-for-shallow-etch-pit-detection-on-silicon-wafers","title":"MF104900 - SEMI MF1049 - Practice for Shallow Etch Pit Detection on Silicon Wafers","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003eThis Practice covers detection of high densities of shallow etch pits on silicon wafers doped either p- or n-type and with resistivities as low as 0.005 Ω·cm. This Practice is applicable for silicon wafers cut from crystals grown in either a (111) or (100) crystal orientation.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eThis Practice is not recommended for use in defect density evaluations, but as a subjective means of estimating defect densities and distributions on the surface of a polished or epitaxial wafer.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eNOTE 1: For determination of shallow and other defect densities in wafer production environments, use of the sequence of procedures in SEMI MF1726, SEMI MF1727, SEMI MF1809, and SEMI MF1810 is recommended.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eThis Practice utilizes a thermal oxidation process followed by a chemical preferential etchant to create and then delineate shallow etch pits.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI C28 — Specification and Guide for Hydrofluoric Acid\u003cbr\u003eSEMI C54 — Specification for Oxygen\u003cbr\u003eSEMI C59 — Specification for Nitrogen\u003cbr\u003eSEMI M17 — Guide for a Universal Wafer Grid\u003cbr\u003eSEMI M59 — Terminology for Silicon Technology\u003cbr\u003eSEMI MF1726 — Practice for Analysis of Crystallographic Perfection of Silicon Wafers\u003cbr\u003eSEMI MF1727 — Practice for Detection of Oxidation Induced Defects in Polished Silicon Wafers\u003cbr\u003eSEMI MF1809 — Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon\u003cbr\u003eSEMI MF1810 — Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafers\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI MF1049-0308 (Reapproved 1123)\u003cbr\u003eSEMI MF1049-0308 (Reapproved 1018)\u003cbr\u003eSEMI MF1049-0308 (Reapproved 0413)\u003cbr\u003eSEMI MF1049-0308 (technical revision)\u003cbr\u003eSEMI MF1049-1107 (technical revision)\u003cbr\u003eSEMI MF1049-0304 (technical revision)\u003cbr\u003eSEMI MF1049-02 (first SEMI publication)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI MF1049-0308 (Reapproved 1123) - Current","offer_id":43106890481731,"sku":"17243","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1049-0308 (Reapproved 1018) - Superseded","offer_id":43106890514499,"sku":"4917","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1049-0308 (Reapproved 0413) - Superseded","offer_id":40234300080195,"sku":"9794","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1049-0308 - Superseded","offer_id":40234300178499,"sku":"9793","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1049-1107 - Superseded","offer_id":40234300276803,"sku":"9795","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1049-0304 - Superseded","offer_id":40234300342339,"sku":"9792","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF1049-02 - Superseded","offer_id":40234300440643,"sku":"9791","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MFVolume_58f2fa02-c7e6-47be-916f-ef229efdaae8.png?v=1776702569","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/mf104900-semi-mf1049-practice-for-shallow-etch-pit-detection-on-silicon-wafers","provider":"SEMI Dev 2","version":"1.0","type":"link"}