{"product_id":"mf057600-semi-mf576-test-method-for-measurement-of-insulator-thickness-and-refractive-index-on-silicon-substrates-by-ellipsometry","title":"MF057600 - SEMI MF576 - Test Method for Measurement of Insulator Thickness and Refractive Index on Silicon Substrates by Ellipsometry","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003eThis Test Method covers the measurement by ellipsometry of the thickness and refractive index of an insulator grown or deposited on a silicon substrate.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eThis Test Method uses monochromatic light.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eThis Test Method is nondestructive and may be used to measure the thickness and refractive index of any film not absorbing light at the measurement wavelength on any substrate (1) not transparent to light at the measurement wavelength, and (2) of a material for which both the refractive index and the absorption coefficient are known at the measurement wavelength.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eTwo procedures for computing the results are provided. If the graphical procedure is used, the measuring wavelength shall be either 546.1 nm or 632.8 nm, and the angle of incidence shall be 70° ± 0.1°.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eWhen this Test Method was developed in the mid-1970’s, manual-null ellipsometers, which are the basis of this Test Method, were in routine use. Since that time, faster, automated instruments have replaced manual-null ellipsometers for all common use in the semiconductor industry. There are two basic types of such automated instruments commonly used: the rotating element null ellipsometer and the rotating element photometric ellipsometer. For each of these, microprocessors or microcomputers are used to operate the instrument and to analyze the data. Details of the procedures utilized in these instruments are usually considered proprietary by the instrument manufacturers.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eTwo major changes have occurred since this Test Method was initially adopted. First, reference materials certified for the thickness of silicon dioxide layers on silicon are available both from the National Institute of Standards and Technology and from commercial sources. These can be used to evaluate the performance of automated ellipsometers. Second, significantly improved materials and procedures have been developed for storage of reference wafers needed for long term testing of baseline performance of ellipsometers. It is not uncommon for reference wafers simply to be stored ‘clean’ with no further wafer cleaning utilized. If cleaning steps are in fact, utilized, they are not those described in this Test Method. The cleaning steps detailed in this Test Method are retained, however, to provide background information on procedures used for the first of the interlaboratory tests.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI C19 — Specification for Acetone\u003cbr\u003eSEMI C31 — Specification for Methanol\u003cbr\u003eSEMI M59 — Terminology for Silicon Technology\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI MF576-0812 (Reapproved 1023)\u003cbr\u003eSEMI MF576-0812 (Reapproved 0718)\u003cbr\u003eSEMI MF576-0812 (technical revision)\u003cbr\u003eSEMI MF576-0706 (Reapproved 1111)\u003cbr\u003eSEMI MF576-0706 (technical revision)\u003cbr\u003eSEMI MF576-01 (first SEMI publication)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI MF576-0812 (Reapproved 1023) - Current","offer_id":43106888122435,"sku":"17198","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF576-0812 (Reapproved 0718) - Superseded","offer_id":43106888155203,"sku":"4962","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF576-0812 - Superseded","offer_id":40234302144579,"sku":"9971","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF576-0706 (Reapproved 1111) - Superseded","offer_id":40234302210115,"sku":"9970","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF576-0706 - Superseded","offer_id":40234302308419,"sku":"9969","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF576-01 - Superseded","offer_id":40234301980739,"sku":"9968","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MFVolume_0500ba90-bcb0-42a6-a616-ff39037b2e9a.png?v=1776702517","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/mf057600-semi-mf576-test-method-for-measurement-of-insulator-thickness-and-refractive-index-on-silicon-substrates-by-ellipsometry","provider":"SEMI Dev 2","version":"1.0","type":"link"}