{"product_id":"mf037400-semi-mf374-test-method-for-sheet-resistance-of-silicon-epitaxial-diffused-polysilicon-and-ion-implanted-layers-using-an-in-line-four-point-probe-with-the-single-configuration-procedure","title":"MF037400 - SEMI MF374 - Test Method for Sheet Resistance of Silicon Epitaxial, Diffused, Polysilicon, and Ion-implanted Layers Using an In-Line Four-Point Probe with the Single-Configuration Procedure","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003eThis Test Method covers the direct measurement of the average sheet resistance of thin layers of silicon formed by epitaxy, diffusion, or implantation onto or below the surface of a circular silicon wafer having the opposite conductivity type from the thin layer to be measured or by the deposition of polysilicon over an insulating layer. Measurements are made at the center of the wafer using a single-configuration of the four-point probe. In this configuration, the current is passed through the outer pins and the resulting potential difference is measured with the inner pins.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eThis Test Method applies to circular samples with diameter greater than 15.9 mm (0.625 in.).\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eThis Test Method is known to be applicable on films having thickness at least 0.2 µm. It can be used to measure sheet resistance in the range 10 Ω to 5,000 Ω, inclusive.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eProcedures for preparing the specimen, for measuring its size, and for determining the temperature of the specimen during the measurement are also given. Abbreviated tables of correction factors appropriate to circular geometry are included with the method so that appropriate calculations can be made conveniently.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eThis Test Method includes procedures for checking both the probe head and the electrical measuring apparatus.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI C19 — Specification for Acetone\u003cbr\u003eSEMI C28 — Specification and Guide for Hydrofluoric Acid\u003cbr\u003eSEMI C31 — Specification for Methanol\u003cbr\u003eSEMI C59 — Specification for Nitrogen\u003cbr\u003eSEMI M59 — Terminology for Silicon Technology\u003cbr\u003eSEMI MF42 — Test Method for Conductivity Type of Extrinsic Semiconducting Materials\u003cbr\u003eSEMI MF1529 — Test Method for Sheet Resistance Uniformity Evaluation by In-Line Four-Point Probe with the Dual-Configuration Procedure\u003cbr\u003eSEMI MF2074 — Guide for Measuring Diameter of Silicon and Other Semiconductor Wafers\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI MF374-0312 (Reapproved 1023)\u003cbr\u003eSEMI MF374-0312 (Reapproved 0718)\u003cbr\u003eSEMI MF374-0312 (technical revision)\u003cbr\u003eSEMI MF374-0307 (technical revision)\u003cbr\u003eSEMI MF374-1105 (technical revision)\u003cbr\u003eSEMI MF374-02 (first SEMI publication)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI MF374-0312 (Reapproved 1023) - Current","offer_id":43106888548419,"sku":"17203","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF374-0312 (Reapproved 0718) - Superseded","offer_id":43106888581187,"sku":"4954","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF374-0312 - Superseded","offer_id":40234305945667,"sku":"9937","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF374-0307 - Superseded","offer_id":40234306011203,"sku":"9936","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF374-1105 - Superseded","offer_id":40234306043971,"sku":"9938","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI MF374-02 - Superseded","offer_id":40234306109507,"sku":"9935","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MFVolume_22bd2378-8f62-41de-8112-4416b3f759e4.png?v=1776702524","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/mf037400-semi-mf374-test-method-for-sheet-resistance-of-silicon-epitaxial-diffused-polysilicon-and-ion-implanted-layers-using-an-in-line-four-point-probe-with-the-single-configuration-procedure","provider":"SEMI Dev 2","version":"1.0","type":"link"}