{"product_id":"m09000-semi-m90-test-method-for-bulk-micro-defect-density-and-denuded-zone-width-in-annealed-silicon-wafers-by-optical-microscopy-after-preferential-etching","title":"M09000 - SEMI M90 - Test Method for Bulk Micro Defect Density and Denuded Zone Width in Annealed Silicon Wafers by Optical Microscopy After Preferential Etching","description":"\u003cbr\u003e\u003cspan style=\"font-family: Arial, sans-serif; font-size: 10pt;\"\u003eThis Standard defines the measurement method for bulk micro\ndefect (BMD) densities and denuded zone (DZ) width in annealed silicon wafers. This\nStandard describes the preferential etching technique to measure BMD density\nand DZ width. The BMD and DZ width are one of important characteristic\nparameters of annealed wafer which has meant the gettering capability.\u003c\/span\u003e\u003cbr\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Standard defines measurement technique of BMD density\nand DZ width. BMD and DZ form in silicon wafers after annealing the wafers with\nheat treatment. The techniques covered in this Standard are intended to measure\nBMD density over a range of 107\/cm3 to 1010\/cm3 and DZ width up to 150 µm.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Standard applies to mirror-finished annealed silicon\nsamples with a specific resistance of 0.01 Ω·cm or greater.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Standard defines measurement techniques for BMD\ndensity and DZ width using a preferential etching technique.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M59 — Terminology for Silicon Technology\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1809 — Guide for Selection and Use of Etching Solutions\nto Delineate Structural Defects in Silicon\u003cspan style=\"background:yellow;\nmso-highlight:yellow\"\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M90-0821 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI M90-0821 - Current","offer_id":40234372235331,"sku":"14617","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MVolume_92114910-255a-4168-a839-eb4009e53303.png?v=1776701685","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/m09000-semi-m90-test-method-for-bulk-micro-defect-density-and-denuded-zone-width-in-annealed-silicon-wafers-by-optical-microscopy-after-preferential-etching","provider":"SEMI Dev 2","version":"1.0","type":"link"}