{"product_id":"m07100-semi-m71-specification-for-silicon-on-insulator-soi-wafers-for-cmos-lsi","title":"M07100 - SEMI M71 - Specification for Silicon-on-Insulator (SOI) Wafers for CMOS LSI","description":"\u003cp style=\"text-align:justify;\" dir=\"ltr\"\u003e \u003c\/p\u003e\u003cp\u003e1  Purpose\u003cbr\u003e1.1  This Specification defines thin-layer silicon-on-insulator (SOI) wafer requirements for CMOS large-scale integrated circuit (LSI) devices. In the case of 200 and 300 mm wafers this Specification is targeted for nodes from 130 to 14 nm. In the case of 150 mm wafers, older LSI generations are included as well. By defining parameters, inspection procedures and acceptance criteria, both suppliers and customers may uniformly define product characteristics and quality requirement.\u003cbr\u003e2  Scope\u003cbr\u003e2.1  This Specification covers SOI wafers manufactured by both Separation by Implantation of Oxygen (SIMOX) or wafer bonding for layer transfer. It defines the properties of SOI wafers that are meant for use in LSI CMOS applications. It specifies the general characteristics of 200 and 300 mm notched SOI wafers. It facilitates selection of customer-driven parameters for 300 mm wafers with the Si film thickness from 8 to 300 nm, and for 200 mm wafers with the Si film thickness from 20 to 300 nm. Furthermore, this Specification also covers 150 mm wafers that typically have a flat instead of a notch. This Specification is intended to be used with the polished wafer specification (SEMI M1). In the case when epitaxial layers are used in fabrication of SOI wafers, the epitaxial wafer specification (SEMI M62), which defines the properties of the epitaxial layer, should also be utilized.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards \u003c\/strong\u003e(purchase separately)\u003cbr\u003eSEMI 3D4 — Guide for Metrology for Measuring Thickness, Total Thickness Variation (TTV), Bow, Warp\/Sori, and Flatness of Bonded Wafer Stacks\u003cbr\u003eSEMI 3D13 — Guide for Measuring Voids in Bonded Wafer Stacks\u003cbr\u003eSEMI M1 — Specification for Polished Single Crystal Silicon Wafers\u003cbr\u003eSEMI M20 — Practice for Establishing a Wafer Coordinate System\u003cbr\u003eSEMI M35 — Guide for Developing Specifications for Silicon Wafer Surface Features Detected by Automated Inspection\u003cbr\u003eSEMI M41 — Specification of Silicon-on-Insulator (SOI) for Power Device\/ICs\u003cbr\u003eSEMI M62 — Specification for Silicon Epitaxial Wafers\u003cbr\u003eSEMI MF26 — Test Method for Determining the Orientation of a Semiconductive Single Crystal\u003cbr\u003eSEMI MF42 — Test Method for Conductivity Type of Extrinsic Semiconducting Materials\u003cbr\u003eSEMI MF81 — Test Method for Measuring Radial Resistivity Variation on Silicon Wafers\u003cbr\u003eSEMI MF84 — Test Method for Measuring Resistivity of Silicon Wafers with an In-Line Four-Point Probe\u003cbr\u003eSEMI MF523 — Practice for Unaided Visual Inspection of Polished Silicon Wafer Surfaces\u003cbr\u003eSEMI MF847 — Test Method for Measuring Crystallographic Orientation of Flats on Single Crystal Silicon Wafers by X-Ray Techniques\u003cbr\u003eSEMI MF1152 — Test Method for Dimensions of Notches on Silicon Wafers\u003cbr\u003eSEMI MF1188 — Test Method for Interstitial Oxygen Content of Silicon by Infrared Absorption with Short Baseline\u003cbr\u003eSEMI MF1390 — Test Method for Measuring Warp on Silicon Wafers by Automated Noncontact Scanning\u003cbr\u003eSEMI MF1809 — Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI M71-0120 (Reapproved 0425)\u003cbr\u003eSEMI M71-0912 (technical revision)\u003cbr\u003eSEMI M71-0310 (technical revision)\u003cbr\u003eSEMI M71-1107 (technical revision)\u003cbr\u003eSEMI M71-0707 (first published)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI M71-0120 (Reapproved 0425) - Current","offer_id":43106891530307,"sku":"18400","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M71-0120 - Superseded","offer_id":43106891563075,"sku":"13720","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M71-0912 - Superseded","offer_id":40234308960323,"sku":"4896","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M71-0310 - Superseded","offer_id":40234309091395,"sku":"9731","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M71-1107 - Superseded","offer_id":40234309189699,"sku":"9733","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M71-0707 - Superseded","offer_id":40234309255235,"sku":"9732","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MVolume_545c13c1-5ff2-4e92-a540-734be13da84a.png?v=1776702584","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/m07100-semi-m71-specification-for-silicon-on-insulator-soi-wafers-for-cmos-lsi","provider":"SEMI Dev 2","version":"1.0","type":"link"}