{"product_id":"m07000-semi-m70-test-method-for-determining-wafer-near-edge-geometry-using-partial-wafer-site-flatness","title":"M07000 - SEMI M70 - Test Method for Determining Wafer-Near-Edge Geometry Using Partial Wafer Site Flatness","description":"\u003cp align=\"justify\" dir=\"ltr\"\u003e \u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003eWafer near edge geometry can significantly affect the yield of semiconductor device processing.\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e　\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003eKnowledge of near edge geometrical properties can help the producer and consumer to determine if the dimensional characteristics of a wafer satisfy given geometrical requirements.\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e　\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003eThis Test Method is suitable quantifying the near edge geometry of wafers used in semiconductor device processing.\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e　\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003eThe PSFQR or PSFQD metric is suitable for quantifying near edge geometry when applying a site pattern that appropriately covers large parts of the wafer edge.\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e　\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003eFlatness metric is well-established therefore partial site flatness can be used as a process control tool as well as a material exchange specification for edge geometry.\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e　\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003eThere are other metrics; that is, ZDD, ESFQR, ROA, some of which quantify more specific aspects of edge geometry.\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e　\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003eThis Test Method covers calculation of the near edge geometry metrics PSFQR and PSFQD.\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e　\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003eSFQR and SFQD are well known parameters and described in detailed in SEMI MF1530. In contrast to SEMI MF1530 the present Test Method is dealing exclusively with the non-full sites (i.e., the partial sites). The Test Method is focused only and specifically on near edge geometry applications.\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e　\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003eThe metrics calculated by this Test Method are based on a thickness data array (see also SEMI MF1530). This array represents the front surface of the wafer when the back surface of the wafer is ideally flat, as when pulled down onto an ideally clean flat chuck.\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e　\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003eThis Test Method is suitable for polished, epitaxial, SOI, or other layer condition.\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e　\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003eThe Test Method is applicable to categories of wafers specified in SEMI M1 used in advanced IC manufacturing.\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e　\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003eThis Test Method does not cover acquisition of the thickness data array. However, it gives the required characteristics of the thickness data array.\u003c\/p\u003e\u003cp align=\"left\" dir=\"ltr\"\u003e \u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cp\u003eSEMI M1 — Specifications for Polished Single Crystal Silicon Wafers\u003cbr\u003eSEMI M20 — Practice for Establishing a Wafer Coordinate System\u003cbr\u003eSEMI M49 — Guide for Specifying Geometry Measurement Systems for Silicon Wafers for the 130 nm to 22 nm Technology Generations\u003cbr\u003eSEMI M59 — Terminology for Silicon Technology\u003cbr\u003eSEMI M67 — Test Method for Determining Wafer Near-Edge Geometry from a Measured Thickness Data Array Using the ESFQR and ESFQD Metrics\u003cbr\u003eSEMI M68 — Test Method for Determining Wafer Near-Edge Geometry from a Measured Height Data Array Using a Curvature Metric, ZDD\u003cbr\u003eSEMI M77 — Test Method for Determining Wafer Near-Edge Geometry Using Roll-Off Amount, ROA\u003cbr\u003eSEMI MF1530 — Test Method for Measuring Flatness, Thickness, and Total Thickness Variation on Silicon Wafers by Automated Noncontact Scanning\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI M70-1015 - Inactive","offer_id":40348665806915,"sku":"4893","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M70-1109 - Superseded","offer_id":40234282713155,"sku":"9730","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M70-1108 - Superseded","offer_id":40234282778691,"sku":"9729","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MVolume_34d802dc-854d-4ac6-9e00-4b4b66d098d9.png?v=1776702587","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/m07000-semi-m70-test-method-for-determining-wafer-near-edge-geometry-using-partial-wafer-site-flatness","provider":"SEMI Dev 2","version":"1.0","type":"link"}