{"product_id":"m06800-semi-m68-test-method-for-determining-wafer-near-edge-geometry-from-a-measured-height-data-array-using-a-curvature-metric-zdd","title":"M06800 - SEMI M68 - Test Method for Determining Wafer Near-Edge Geometry from a Measured Height Data Array Using a Curvature Metric, ZDD","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eWafer near-edge geometry can significantly affect the yield of semiconductor device processing.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eKnowledge of near-edge geometrical properties can help the producer and consumer determine if the dimensional characteristics of a specimen wafer satisfy given geometrical requirements.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThe metric, ZDD, quantifies the near-edge curvature of wafers used in semiconductor device processing.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eConsideration should be given to the use of this or other proposed near-edge geometry metrics as a process control tool rather than a material exchange specification.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Test Method covers calculation of near-edge curvature ZDD (radial double derivative of z [height]).\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThe metric calculated by this Test Method is based on a height data array; either a single surface (front or back) or thickness.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Test Method is suitable for polished, epitaxial, SOI, or other layer condition.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThe Test Method is applicable to categories of wafers specified in SEMI M1 used in advanced IC manufacturing.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Test Method does not cover acquisition of the height data array. However, it gives the required characteristics of the height data array.\u003c\/font\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e\u003cfont face=\"arial\" size=\"2\"\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003c\/font\u003e\u003cp\u003e\u003cfont face=\"arial\" size=\"2\"\u003eSEMI M1 — Specification for Polished Single Crystal Silicon Wafers\u003cbr\u003e SEMI M20 — Practice for Establishing a Wafer Coordinate System\u003cbr\u003e SEMI M59 — Terminology for Silicon Technology\u003cbr\u003e SEMI M67 — Test Method for Determining Wafer Near-Edge Geometry from a Measured Thickness Data Array Using the ESFQR, ESFQD and ESBIR Metrics\u003cbr\u003e SEMI M70 — Test Method for Determining Wafer-Near-Edge Geometry Using Partial Wafer Site Flatness\u003cbr\u003e SEMI M77 — Test Method for Determining Wafer Near-Edge Geometry Using Roll-Off Amount, ROA\u003cbr\u003e SEMI MF1530 — Test Method for Measuring Flatness, Thickness, and Total Thickness Variation on Silicon Wafers by Automated Noncontact Scanning\u003c\/font\u003e\u003cbr\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI M68-0720 - Current","offer_id":40234287530051,"sku":"14126","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M68-1015 - Superseded","offer_id":40234287595587,"sku":"4891","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M68-0315 - Superseded","offer_id":40234287661123,"sku":"9726","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M68-1109 - Superseded","offer_id":40234287693891,"sku":"9728","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M68-1108 - Superseded","offer_id":40234287726659,"sku":"9727","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MVolume_060ea082-0b2c-49e2-8732-3f94abeddf6e.png?v=1776702588","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/m06800-semi-m68-test-method-for-determining-wafer-near-edge-geometry-from-a-measured-height-data-array-using-a-curvature-metric-zdd","provider":"SEMI Dev 2","version":"1.0","type":"link"}