{"product_id":"m06500-semi-m65-specification-for-sapphire-substrates-to-use-for-compound-semiconductor-epitaxial-wafers","title":"M06500 - SEMI M65 - Specification for Sapphire Substrates to use for Compound Semiconductor Epitaxial Wafers","description":"\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cbr\u003e\u003cb\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eNOTICE: This Standard was balloted and approved for withdrawal in 2022.\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/b\u003e\u003cbr\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003eSapphire substrates are utilized for hetero-epitaxial growth of gallium nitride and related film. The properties of the films depend in part on the properties of the substrates used. This Specification is intended to provide specifications for the criteria necessary to use for growth of films suitable for device production, and to unify the notation method of sapphire substrate.\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003eThis Specification covers requirements for three sizes (50.8 mm, 76.2 mm, and 100 mm) of monocrystalline high-purity polished sapphire substrates. Dimensional and crystallographic orientation characteristics are the only standardized properties set forth herein. A purchase specification may require additional physical properties, which should be defined. Many of these properties are listed, together with test methods suitable for determining their magnitude. Additional information and recommended specification levels for several of these properties are provided in Related Information sections.\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003eThis Specification is directed specifically to sapphire substrates with one polished surface. Substrates polished on both sides, or unpolished, or with epitaxial film, are not covered; however, customers of such substrates will find that these specifications are useful guides in defining their requirements.\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003eThe notations of crystallographic orientation are unified to prevent possible misunderstandings. The symbols written by capital or small letters must be strictly used with distinction for the correct expression of a crystal plane.\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003eOptical measurement methods are widely used to evaluate flatness of substrate, owing to their precise and easy handling. Therefore, the items of Sori, Taper, GBIR and GFLR are introduced, in order to examine strained or unrestrained surface flatness more appropriately.\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI M1 — Specification for Polished Single Crystal Silicon Wafers\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI M3 — Specifications for Polished Monocrystalline Sapphire Substrates (Withdrawn 0707)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI MF26 — Test Method for Determining the Orientation of a Semiconductive Single Crystal\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI MF523 — Practice for Unaided Visual Inspections of Polished Silicon Wafer Surfaces\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI MF533 — Test Method for Thickness and Thickness Variations of Silicon Wafers\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI MF671 — Test Method for Measuring Flat Length on Wafers of Silicon and Other Electronic Materials\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI MF847 — Test Method for Measuring Crystalographic Orientation of Flats on Single Crystal Silicon Wafers by X-Ray Techniques\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI MF928 — Test Method for Edge Contour of Circular Semiconductor Wafers and Rigid Disk Substrates\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI MF1810 — Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafers\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI MF2074 — Guide for Measuring Diameter of Silicon and Other Semiconductor Wafers\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cbr\u003e\u003cb\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eRevision History\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/b\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI M65-0816 (Withdrawn 0123)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI M65-0816 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI M65-0306E2 (editorial revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI M65-0306E (editorial revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI M65-0306 (first published)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI M65-0816 (Withdrawn 0123) - Withdrawn","offer_id":40378954580035,"sku":"16357","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MVolume_e20c429f-ea54-432b-9eb4-b06126142f85.png?v=1776702591","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/m06500-semi-m65-specification-for-sapphire-substrates-to-use-for-compound-semiconductor-epitaxial-wafers","provider":"SEMI Dev 2","version":"1.0","type":"link"}