{"product_id":"m05500-semi-m55-specification-for-polished-monocrystalline-silicon-carbide-wafers","title":"M05500 - SEMI M55 - Specification for Polished Monocrystalline Silicon Carbide Wafers","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cbr\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt; \n \n line-height:107%;font-family:\"Arial\",sans-serif'\u003eThese specifications cover \n \n substrate requirements for monocrystalline high-purity silicon carbide wafers \n \n of crystallographic polytype 6H and 4H used in semiconductor and electronic \n \n device manufacturing.\u003c\/span\u003e\u003cspan style='font-size:10.0pt;line-height:107%; \n \n font-family:\"Arial\",sans-serif'\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt; \n \n line-height:107%;font-family:\"Arial\",sans-serif'\u003eA complete purchase \n \n specification may require the defining of additional physical, electrical, and \n \n bulk properties. These properties are listed, together with test methods \n \n suitable for determining their magnitude where such procedures are documented.\u003c\/span\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\"Arial\",sans-serif'\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt; \n \n line-height:107%;font-family:\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style=\"mso-bookmark:_Toc488141077\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\"Arial\",sans-serif'\u003eThese \n \n specifications are directed specifically to silicon carbide wafers with one or \n \n both sides polished. Unpolished wafers or wafers with epitaxial films are not \n \n covered; however, purchasers of such wafers may find these specifications \n \n helpful in defining their requirements.\u003c\/span\u003e\u003c\/span\u003e\u003cspan style='font-size: \n \n 10.0pt;line-height:107%;font-family:\"Arial\",sans-serif'\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M1 — Specification for Polished Single Crystal Silicon \n \n Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M59 — Terminology for Silicon Technology\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M81 — Guide to Defects Found on Monocrystalline \n \n Silicon Carbide Substrates\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M83 — Test Method for Determination of Dislocation \n \n Etch Pit Density in Monocrystals of III-V Compound Semiconductors\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M87 — Test Method for Contactless Resistivity \n \n Measurement of Semi-Insulating Semiconductors\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI MF26 — Test Method for Determining the Orientation of \n \n a Semiconductive Single Crystal\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI MF154 — Guide for Identification of Structures and \n \n Contaminants Seen on Specular Silicon Surfaces\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI MF523 — Practice for Unaided Visual Inspection of \n \n Polished Silicon Wafer Surfaces\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI MF671 — Test Method for Measuring Flat Length on \n \n Wafers of Silicon and Other Electronic Materials\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI MF673 — Test Method for Measuring Resistivity of \n \n Semiconductor Wafers or Sheet Resistance of Semiconductor Films with a \n \n Noncontact Eddy-Current Gauge\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI MF847 — Test Method for Measuring Crystallographic \n \n Orientation of Flats on Single Crystal Silicon Wafers by X-Ray Techniques\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI MF928 — Test Method for Edge Contour of Circular \n \n Semiconductor Wafers and Rigid Disk Substrates\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI MF1390 — Test Method for Measuring Bow and Warp on \n \n Silicon Wafers by Automated Noncontact Scanning\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI MF1530 — Test Method for Measuring Flatness, \n \n Thickness, and Total Thickness Variation on Silicon Wafer by Automated \n \n Noncontact Scanning\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI MF2074 — Guide for Measuring Diameter of Silicon and \n \n Other Semiconductor Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI T5 — Specification for Alphanumeric Marking of Round \n \n Compound Semiconductor Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M55-0921 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M55-0817 (complete rewrite to combine SEMI M55.1, SEMI \n \n M55.2, SEMI M55.3, and SEMI M55.4)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M55-0315 (designation update)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M55-0814 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M55-0308 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M55-0705 (designation update)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M55-0304 (designation update)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI M55-0303 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI M55-0921 - Current","offer_id":40234306797635,"sku":"14683","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M55-0817 - Superseded","offer_id":40234306863171,"sku":"4869","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M55-0315 - Superseded","offer_id":40234306961475,"sku":"9657","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M55-0814 - Superseded","offer_id":40234307027011,"sku":"9659","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M55-0308 - Superseded","offer_id":40234307092547,"sku":"9655","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M55-0304 - Superseded","offer_id":40234307158083,"sku":"9654","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M55-0705 - Superseded","offer_id":40234307223619,"sku":"9658","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MVolume_441f6384-130f-4c70-a15c-dc9aedc87ad1.png?v=1776702606","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/m05500-semi-m55-specification-for-polished-monocrystalline-silicon-carbide-wafers","provider":"SEMI Dev 2","version":"1.0","type":"link"}