{"product_id":"m05000-semi-m50-test-method-for-determining-capture-rate-and-false-count-rate-for-surface-scanning-inspection-systems-by-the-overlay-method","title":"M05000 - SEMI M50 - Test Method for Determining Capture Rate and False Count Rate for Surface Scanning Inspection Systems by the Overlay Method","description":"\u003cp\u003e\n   \n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eThis Test Method covers determination of the CR, the false count rate (FCR) and the cumulative false count rate (CFCR) of an SSIS as a function of the latex sphere equivalent (LSE) size of localized light scatterers (LLSs).\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n   \n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eThis Test Method addresses calculating and reporting SSIS CR from measurements of either PSL depositions or other LLSs on wafers in LSE units.\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n   \n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eTwo test methods are covered:\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eStatic Method — In which the test is conducted under level 1 variability conditions (without removing the wafer from the stage of the SSIS between scans).\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eDynamic Method — In which the test is conducted under level 2 variability conditions (with removing the wafer from and reloading it to the stage of the SSIS between scans).\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n   \n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSpecific wafer surfaces (by wafer product, type of film or type of polish) that may affect the measured CR and FCR of an SSIS are to be agreed upon between suppliers and customers.\u003c\/span\u003e\n\u003c\/p\u003e\u003cp\u003e\n   \n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI E89 — Guide for Measurement System Analysis (MSA)\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M1 — Specification for Polished Single Crystal Silicon Wafers\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M52 — Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130 nm to 11 nm Technology Generations\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M53 — Practice for Calibrating Scanning Surface Inspection Systems Using Certified Depositions of Monodisperse Reference Spheres on Unpatterned Semiconductor Wafer Surfaces\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M59 — Terminology for Silicon Technology\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n   \n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M50-0923 (technical revision)\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M50-1116 (technical revision)\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M50-1015 (technical revision)\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M50-0310 (technical revision)\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M50-1109 (technical revision)\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M50-0307 (technical revision)\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M50-1104 (technical revision)\u003c\/span\u003e\n\u003c\/p\u003e\n\u003cp\u003e\n  \u003cspan style='font-family:\"Microsoft Sans Serif\",sans-serif;font-size:10.0pt;'\u003eSEMI M50-1101 (first published)\u003c\/span\u003e\n\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI M50-0923 - Current","offer_id":43106892251203,"sku":"17138","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M50-1116 - Superseded","offer_id":43106892283971,"sku":"4862","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M50-1015 - Superseded","offer_id":40234285334595,"sku":"9623","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M50-0310 - Superseded","offer_id":40234285367363,"sku":"9621","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M50-1109 - 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