{"product_id":"m04900-semi-m49-130-nmから65-nmへの技術世代のシリコンウェーハ用ジオメトリ測定システム規定のためのガイド","title":"M04900 - SEMI M49 - 130 nmから65 nmへの技術世代のシリコンウェーハ用ジオメトリ測定システム規定のためのガイド","description":"\u003cp class=\"Indent\" style=\"MARGIN: 0in 21pt 0pt\"\u003e\u003cfont size=\"2\"\u003e\u003cfont size=\"2\"\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\u003cfont style=\"\"\u003e\u003cfont style=\"\"\u003e\u003ch2 style=\"margin: 3pt 0in;\"\u003e\u003cspan lang=\"JA\" style=\"font-weight: normal;\"\u003e\u003cfont face=\"arial\" style=\"\" size=\"2\"\u003e本ガイドは\u003cspan style=\"font-weight: normal;\"\u003eInternational Technology Roadmap for Semiconductors\u003cspan lang=\"JA\" style=\"font-weight: normal;\"\u003e：\u003cspan style=\"font-weight: normal;\"\u003e 1999 edition \u003cspan lang=\"JA\" style=\"font-weight: normal;\"\u003e（\u003cspan style=\"font-weight: normal;\"\u003eITRS\u003cspan lang=\"JA\" style=\"font-weight: normal;\"\u003e）によって予測され，主要半導体デバイスメーカーが計画している，\u003cspan style=\"font-weight: normal;\"\u003e130\u003cspan lang=\"JA\" style=\"font-weight: normal;\"\u003e，\u003cspan style=\"font-weight: normal;\"\u003e90\u003cspan lang=\"JA\" style=\"font-weight: normal;\"\u003e，\u003cspan style=\"font-weight: normal;\"\u003e65 nm\u003cspan lang=\"JA\" style=\"font-weight: normal;\"\u003e技術世代のシリコンウェーハのジオメトリおよび平坦度についての測定システムを規定するための推奨事項を提供するものである。\u003cspan style=\"font-weight: normal;\"\u003eSEMI M1\u003cspan lang=\"JA\" style=\"font-weight: normal;\"\u003e，\u003cspan style=\"font-weight: normal;\"\u003eSEMI M8\u003cspan lang=\"JA\" style=\"font-weight: normal;\"\u003e，\u003cspan style=\"font-weight: normal;\"\u003eSEMI M11\u003cspan lang=\"JA\" style=\"font-weight: normal;\"\u003e，\u003cspan style=\"font-weight: normal;\"\u003eSEMI M24\u003cspan lang=\"JA\" style=\"font-weight: normal;\"\u003e，\u003cspan style=\"font-weight: normal;\"\u003eSEMI M38\u003cspan lang=\"JA\" style=\"font-weight: normal;\"\u003eに定義されているウェーハのパラメータは，シリコンウェーハ・サプライヤにとっては顧客によって指定され，通常適合性証明の一部となる。シリコンウェーハ・サプライヤおよび顧客は，これらのパラメータを，異なるメーカーの装置を使用するか，あるいは同じサプライヤでも異なる世代の装置を使用して測定することがある。測定システムの基本的な特徴および能力に関する合意は，適切なシステムの調達と同様，データ交換およびデータ解釈を改善する。\u003cspan style=\"font-weight: normal;\"\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/h2\u003e\n\u003cp dir=\"ltr\" align=\"justify\" style=\"\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e \u003c\/font\u003e\u003c\/p\u003e\n\u003cfont face=\"arial\" style=\"\" size=\"2\"\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003c\/font\u003e\u003cp style=\"\"\u003e\u003cfont style=\"\"\u003e\u003cfont style=\"\"\u003e\u003cfont style=\"\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\" style=\"box-sizing: border-box;\"\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\n\u003cp style=\"margin: 0px; padding: 0px; box-sizing: border-box;\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eSEMI E1.9 — Mechanical Specification for Cassettes Used to Transport and Store 300 mm Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI E5 — Specification for SEMI Equipment Communications Standard 2 Message Content (SECS-II)\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI E10 — Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and Utilization\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI E19 — Specification for Standard Mechanical Interface (SMIF)\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI E30 — Specification for the Generic Model for Communications and Control of Manufacturing Equipment (GEM)\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI E37 — High Speed SECS Message Services (HSMS) Generic Services\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI E47 — Specification for 150 mm\/200 mm Pod Handles\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI E47.1 — Mechanical Specification for FOUPS Used to Transport and Store 300 mm Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI E58 — Automated Reliability, Availability, and Maintainability Standard (ARAMS): Concepts, Behavior, and Services\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI E89 — Guide for Measurement System Analysis (MSA)\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI E158 — Mechanical Specification for Fab Wafer Carrier Used to Transport and Store 450 mm Wafers (450 FOUP) and Kinematic Coupling\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI E159 — Mechanical Specification for Multi Application Carrier (MAC) Used to Transport and Ship 450 mm Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M1 — Specification for Polished Single Crystal Silicon Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M8 — Specification for Polished Monocrystalline Silicon Test Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M12 — Specification for Serial Alphanumeric Marking of the Front Surface of Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M13 — Specification for Alphanumeric Marking of Silicon Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M24 — Specification for Polished Monocrystalline Silicon Premium Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M31 — Specification for Mechanical Features of Front-Opening Shipping Box Used to Transport and Ship 300 mm Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M38 — Specification for Polished Reclaimed Silicon Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M43 — Guide for Reporting Wafer Nanotopography\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M59 — Terminology for Silicon Technology\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M62 — Specification for Silicon Epitaxial Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M67 — Practice for Determining Wafer Near-Edge Geometry from a Measured Thickness Data Array Using the ESFQR, ESFQD and ESBIR Metrics\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M68 — Practice for Determining Wafer Near-Edge Geometry from a Measured Height Data Array Using a Curvature Metric, ZDD\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M73 — Test Methods for Extracting Relevant Characteristics from Measured Wafer Edge Profiles\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI M80 — Specification for Front-Opening Shipping Box Used to Transport and Ship 450 mm Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI MF42 — Test Method for Conductivity Type of Extrinsic Semiconducting Materials\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI MF84 — Test Method for Measuring Resistivity of Silicon Wafers with an In-Line Four-Point Probe\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI MF534 — Test Method for Bow of Silicon Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI MF657 — Test Method for Measuring Warp and Total Thickness Variation on Silicon Wafers by Noncontact Scanning\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI MF671 — Test Method for Measuring Flat Length on Wafers of Silicon and Other Electronic Materials\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI MF673 — Test Method for Measuring Resistivity of Semiconductor Wafers or Sheet Resistance of Semiconductor Films with a Noncontact Eddy-Current Gauge\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI MF928 — Test Method for Edge Contour of Circular Semiconductor Wafers and Rigid Disk Substrates\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI MF1152 — Test Method for Dimensions of Notches on Silicon Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI MF1390 — Test Method for Measuring Bow and Warp on Silicon Wafers by Automated Noncontact Scanning\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI MF1451 — Test Method for Measuring Sori on Silicon Wafers by Automated Noncontact Scanning\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI MF1530 — Test Method for Measuring Flatness, Thickness, and Thickness Variation on Silicon Wafers by Automated Noncontact Scanning\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI MF2074 — Guide for Measuring Diameter of Silicon and Other Semiconductor Wafers\u003cbr style=\"box-sizing: border-box;\"\u003eSEMI T7 — Specification for Back Surface Marking of Double-Side Polished Wafers with a Two-Dimensional Matrix Code Symbol\u003c\/font\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/font\u003e","brand":"semi.org","offers":[{"title":"SEMI M49-0918 - Current","offer_id":40234365681731,"sku":"13510","price":38100.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M49-0613 - Superseded","offer_id":40234365714499,"sku":"9611","price":38100.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M49-0912 - Superseded","offer_id":40234365747267,"sku":"9614","price":38100.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M49-0412 - Superseded","offer_id":40234365780035,"sku":"9609","price":38100.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M49-1011 - Superseded","offer_id":40234365812803,"sku":"9616","price":38100.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M49-0311 - Superseded","offer_id":40234365845571,"sku":"9607","price":38100.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M49-0307 - Superseded","offer_id":40234365878339,"sku":"9605","price":38100.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MVolume_17991a2b-38f4-43b8-964b-688a986d7616.png?v=1776702042","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/m04900-semi-m49-130-nm%e3%81%8b%e3%82%8965-nm%e3%81%b8%e3%81%ae%e6%8a%80%e8%a1%93%e4%b8%96%e4%bb%a3%e3%81%ae%e3%82%b7%e3%83%aa%e3%82%b3%e3%83%b3%e3%82%a6%e3%82%a7%e3%83%bc%e3%83%8f%e7%94%a8%e3%82%b8%e3%82%aa%e3%83%a1%e3%83%88%e3%83%aa%e6%b8%ac%e5%ae%9a%e3%82%b7%e3%82%b9%e3%83%86%e3%83%a0%e8%a6%8f%e5%ae%9a%e3%81%ae%e3%81%9f%e3%82%81%e3%81%ae%e3%82%ac%e3%82%a4%e3%83%89","provider":"SEMI Dev 2","version":"1.0","type":"link"}