{"product_id":"m04800-semi-m48-guide-for-evaluating-chemical-mechanical-polishing-processes-of-films-on-unpatterned-silicon-substrates","title":"M04800 - SEMI M48 - Guide for Evaluating Chemical-Mechanical Polishing Processes of Films on Unpatterned Silicon Substrates","description":"\u003cp\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003eThis standard was technically approved by the global Silicon Wafer Committee. This edition was approved for publication by the global Audits \u0026amp; Reviews Subcommittee on August 27, 2010. Initially available at www.semi.org in October 2010. Originally published November 2001. \u003c\/font\u003e\u003c\/p\u003e \u003cp\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e \u003c\/font\u003e\u003c\/p\u003e \u003cp\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003eNOTICE: This document was balloted and approved for withdrawal in 2010. \u003c\/font\u003e\u003c\/p\u003e \u003cp\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e \u003c\/font\u003e\u003c\/p\u003e \u003cp\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003eThe purpose of this document is to provide a guide for evaluation of chemical-mechanical polishing (CMP) processes of thin films on unpatterned silicon substrates. This includes recommended procedures for process testing and reporting formats. This guide is intended for use by both suppliers and end users. \u003c\/font\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eSEMI E89 — Guide for Measurement System Analysis (MSA) \u003cbr\u003eSEMI M1 — Specifications for Polished Single Crystal Silicon Wafers \u003cbr\u003eSEMI M20 — Specification for Establishing a Wafer Coordinate System \u003cbr\u003eSEMI M62 — Specifications for Silicon Epitaxial Wafers \u003cbr\u003e\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI M48-1101 (Withdrawn 1110) - Withdrawn - Historical","offer_id":40234365157443,"sku":"9603","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MVolume_08511373-4aae-40b4-8598-b74576365622.png?v=1776702043","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/m04800-semi-m48-guide-for-evaluating-chemical-mechanical-polishing-processes-of-films-on-unpatterned-silicon-substrates","provider":"SEMI Dev 2","version":"1.0","type":"link"}