{"product_id":"m04700-semi-m47-specification-for-silicon-on-insulator-soi-wafers-for-cmos-lsi-applications","title":"M04700 - SEMI M47 - Specification for Silicon-on-Insulator (SOI) Wafers for CMOS LSI Applications","description":"\u003cp\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003eThis standard was technically approved by the global Silicon Wafer Committee. This edition was approved for publication by the global Audits \u0026amp; Reviews Subcommittee on April 25, 2007. Initially available at www.semi.org in October 2010. Originally published November 2001; previously published July 2007. \u003c\/font\u003e\u003c\/p\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e \u003cp\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e \u003c\/font\u003e\u003c\/p\u003e\n\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e \u003cp\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003eNOTICE: This document was balloted and approved for withdrawal in 2010. \u003c\/font\u003e\u003c\/p\u003e\n\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e \u003cp\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e \u003c\/font\u003e\u003c\/p\u003e\n\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e \u003cp\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003eThis specification defines thin-layer silicon-on-insulator (SOI) wafer requirements for CMOS large scale integrated circuit (LSI) devices. In another aspect, this specification defines the generic characteristics of SIMOX and bonded SOI wafers having typically no more than 0.2 μm SOI layer thickness. By defining parameters, inspection procedures and acceptance criteria, both suppliers and customers may uniformly define product characteristics and quality requirements. \u003c\/font\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont face=\"Microsoft Sans Serif\" size=\"2\"\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eSEMI M1 — Specifications for Polished Single Crystal Silicon Wafers \u003cbr\u003eSEMI M18 — Guide for Developing Specification Forms for Order Entry of Silicon Wafers \u003cbr\u003eSEMI M35 — Guide for Developing Specifications for Silicon Wafer Surface Features Detected by Automated Inspection \u003cbr\u003eSEMI M41 — Specification of Silicon-on-Insulator (SOI) for Power Device\/ICs \u003cbr\u003eSEMI M53 — Practice for Calibrating Scanning Surface Inspection Systems Using Certified Depositions of Polystyrene Latex Spheres on Unpatterned Semiconductor Wafer Surfaces \u003cbr\u003eSEMI M59 — Terminology for Silicon Technology \u003cbr\u003eSEMI MF26 — Test Methods for Determining the Orientation of a Semiconductive Single Crystal \u003cbr\u003eSEMI MF42 — Test Methods for Conductivity Type of Extrinsic Semiconductor Materials \u003cbr\u003eSEMI MF84 — Test Method for Measuring Resistivity of Silicon Wafers with an In-Line Four-Point Probe \u003cbr\u003eSEMI MF523 — Practice for Unaided Visual Inspection of Polished Silicon Wafer Surfaces \u003cbr\u003eSEMI MF533 — Test Method for Thickness and Thickness Variation of Silicon Wafers \u003cbr\u003eSEMI MF671 — Test Method for Measuring Flat Length on Wafers of Silicon and Other Electronic Materials \u003cbr\u003eSEMI MF928 — Test Methods for Edge Contour of Circular Semiconductor Wafers and Rigid Disk Substrates \u003cbr\u003eSEMI MF1152 — Test Methods for Dimensions of Notches on Silicon Wafers \u003cbr\u003eSEMI MF1188 — Test Method for Interstitial Oxygen Content of Silicon by Infrared Absorption with Short Baseline \u003cbr\u003eSEMI MF1390 — Test Method for Measuring Warp on Silicon Wafers by Automated Noncontact Scanning \u003cbr\u003eSEMI MF1530 — Test Method for Measuring Flatness, Thickness, and Thickness Variation on Silicon Wafers by Automated Noncontact Scanning \u003cbr\u003eSEMI MF1619 — Test Method for Measurement of Interstitial Oxygen Content of Silicon Wafers by Infrared Absorption Spectroscopy with p-Polarized Radiation Incident at Brewster Angle \u003cbr\u003eSEMI MF2074 — Guide for Measuring Diameter of Silicon and Other Semiconductor Wafers \u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e","brand":"semi.org","offers":[{"title":"SEMI M47-0707 (Withdrawn 1110) - Withdrawn","offer_id":40234356867139,"sku":"9602","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MVolume_11bfa3fb-b2eb-4ca1-9d4c-4ee642c19504.png?v=1776702044","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/m04700-semi-m47-specification-for-silicon-on-insulator-soi-wafers-for-cmos-lsi-applications","provider":"SEMI Dev 2","version":"1.0","type":"link"}