{"product_id":"m04100-semi-m41-specification-of-silicon-on-insulator-soi-for-power-device-ics","title":"M04100 - SEMI M41 - Specification of Silicon-on-Insulator (SOI) for Power Device\/ICs","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003e\u003cstrong\u003eNOTICE: \u003c\/strong\u003eThis Document was completely rewritten in 2022.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eThis Specification covers requirements for silicon on insulator (SOI) for semiconductor power-device\/IC manufacture. By defining inspection procedures and acceptance criteria, both users and suppliers may define product characteristics and quality requirements.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eThis Specification provides requirements of SOI wafers, which are used for power devices\/ICs of specific voltage applications. The specification described here covers physical, electrical, and surface parameters of each layer along with each voltage range for wafers ≤200 mm and separately, the range for 300 mm wafers\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI 3D17 — Specification for Reference Material for Bonded Wafer Stack Void Metrology\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI M1 — Specification for Polished Single Crystal Silicon Wafers\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI M12 — Specification for Serial Alphanumeric Marking of Silicon Wafers\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI M13 — Specification for Alphanumeric Marking of Silicon Wafers with Crystal Properties\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI M52 — Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130 nm to 5 nm Technology Generations\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI M53 — Practice for Calibrating Scanning Surface Inspection Systems Using Certified Depositions of Polystyrene Latex Spheres on Unpatterned Semiconductor Wafer Surfaces\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI M71 — Specification for Silicon-on-Insulator (SOI) Wafers for CMOS LSI\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF26 — Test Methods for Determining the Orientation of a Semiconductive Single Crystal\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF42 — Test Methods for Conductivity Type of Extrinsic Semiconducting Materials\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF43 — Test Methods for Resistivity of Semiconductor Materials\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF84 — Test Method for Measuring Resistivity of Silicon Wafers with an In-Line Four-Point Probe\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF95 — Test Method for Thickness of Lightly Doped Silicon Epitaxial Layers on Heavily Doped Silicon Substrates Using an Infrared Dispersive Spectrophotometer\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF110 — Test Method for Thickness of Epitaxial or Diffused Layers in Silicon by the Angle Lapping and Staining Technique\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF154 — Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF523 — Practice for Unaided Visual Inspection of Polished Silicon Wafer Surfaces\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF533 — Test Method for Thickness and Thickness Variation of Silicon Wafers\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF576 — Test Method for Measurement of Insulator Thickness and Refractive Index on Silicon Substrates by Ellipsometry\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF671 — Test Method for Measuring Flat Length on Wafers of Silicon and Other Electronic Materials\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF847 — Test Method for Measuring Crystallographic Orientation of Flats on Single Crystal Silicon Wafers by X-Ray Techniques\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF928 — Test Method for Edge Contour of Circular Semiconductor Wafers and Rigid Disk Substrates\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1152 —Test Method for Dimensions of Notches on Silicon Wafers\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1153 — Test Method for Characterization of Metal-Oxide Silicon (MOS) Structures by Capacitance-Voltage Measurements\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1188 — Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption with Short Baseline\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1390 — Test Method for Measuring Warp on Silicon Wafers by Automated Noncontact Scanning\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1391 — Test Method for Substitutional Atomic Carbon Content of Silicon by Infrared Absorption\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1527 — Guide for Application of Silicon Standard Reference Materials and Reference Wafers for Calibration and Control of Instruments for Measuring Resistivity of Silicon\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1530 — Test Method for Measuring Flatness, Thickness, and Thickness Variation on Silicon Wafers by Automated Noncontact Scanning\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1535 — Test Method for Carrier Recombination Lifetime in Silicon Wafers by Noncontact Measurement of Photoconductivity Decay by Microwave Reflectance\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1617 — Test Method for Measuring Surface Sodium, Aluminum, Potassium, and Iron on Silicon and EPI Substrates by Secondary Ion Mass Spectroscopy\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1619 — Test Method for Measurement of Interstitial Oxygen Content of Silicon Wafers by Infrared Absorption Spectroscopy with p-Polarized Radiation Incident at Brewster Angle\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1630 — Test Method for Low Temperature FT-IR Analysis of Single Crystal Silicon for III-V Impurities\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI MF1726 — Practice for Analysis of Crystallographic Perfection of Silicon 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