{"product_id":"m02000-semi-m20-practice-for-establishing-a-wafer-coordinate-system","title":"M02000 - SEMI M20 - Practice for Establishing a Wafer Coordinate System","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eNOTICE: This Document was reapproved with minor editorial\nchanges.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eProcessing systems now employed in advanced device\nmanufacturing use aligning mechanisms to position the wafer rotationally and in\nx-y prior to processing. Many of these scan the wafer periphery and determine\nthe geometric center of the wafer surface. This is most often seen on stepping\naligners, to minimize the effects of wafer-to-wafer diameter variation in mixed\naligner type fabs. Similar center-referencing subsystems are found on many\ncharacterization systems. The wafer coordinate system provides a method for\nreferencing any other coordinate system, such as a site, pattern, or mapping\narray, to the physical geometry of the wafer surface.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eIf the points of the array lie on the front surface of the\nwafer, only the x and y (or r and θ) coordinates are relevant. It has become\nincreasingly important in semiconductor material and device manufacturing to\ndescribe, in unambiguous terms, the position of a point on a wafer that\nautomatic processing, test, or characterization equipment can recognize and\nlocate. For example, characterization equipment needs to report the precise\nlocations of defects and anomalies discovered in wafers before or after\nprocessing in order to relate the presence or absence of such defects and\nanomalies to device yield variations. The wafer coordinate system can be used\nto establish the coordinates of each point of interest, and, through\ntransformation to the yield analysis coordinate system, relate them to the die\nyield map.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eIn response to these needs, this Practice defines a wafer\ncoordinate system to facilitate the precise locating and reporting of points on\nthe wafer surface. If the point or points lie above or below the surface, the\nz-coordinate must also be used. Because the zero point on the z-axis is\napplication specific, this Practice treats the x-y-z (or r-\u003c\/span\u003e\u003cspan style=\"font-size:10.0pt;line-height:107%;font-family:Symbol;mso-ascii-font-family:\nArial;mso-hansi-font-family:Arial;mso-bidi-font-family:Arial;mso-char-type:\nsymbol;mso-symbol-font-family:Symbol\"\u003e\u003cspan style=\"mso-char-type:symbol;\nmso-symbol-font-family:Symbol\"\u003eq\u003c\/span\u003e\u003c\/span\u003e\u003cspan style='font-size:10.0pt;\nline-height:107%;font-family:\"Arial\",sans-serif'\u003e-z) system separately from the\nsurface coordinate system.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Practice covers procedures for defining a wafer\ncoordinate system for locating uniquely any point on a wafer surface using the\nwafer center as the origin and either Cartesian (x-y) or polar (r-θ)\ncoordinates.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eFor unpatterned wafers, this wafer coordinate system can be\nused directly or in conjunction with a rectangular or polar overlay array.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis wafer coordinate system can also be used to locate the\norigins or other reference points of other coordinate systems used to define or\nreport position data of site, die, or map arrays on the front or back surface\nof a patterned or unpatterned wafer. In this way, the array coordinate system\nmay be referenced to the physical geometry of the wafer. Selected modes of\napplication of the wafer coordinate system are given for information only in\nRelated Information 1.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Practice also covers procedures for defining a\nthree-dimensional x-y-z (or r-\u003c\/span\u003e\u003cspan style=\"font-size:10.0pt;line-height:\n107%;font-family:Symbol;mso-ascii-font-family:Arial;mso-hansi-font-family:Arial;\nmso-bidi-font-family:Arial;mso-char-type:symbol;mso-symbol-font-family:Symbol\"\u003e\u003cspan style=\"mso-char-type:symbol;mso-symbol-font-family:Symbol\"\u003eq\u003c\/span\u003e\u003c\/span\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\"Arial\",sans-serif'\u003e-z)\ncoordinate system for the wafer.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E5 — Specification for SEMI Equipment Communications\nStandard 2 Message Content (SECS-II)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M1 — Specification for Polished Single Crystal Silicon\nWafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M12 — Specification for Serial Alphanumeric Marking of\nthe Front Surface of Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M13 — Specification for Alphanumeric Marking of\nSilicon Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M17 — Guide for a Universal Wafer Grid\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M59 — Terminology for Silicon Technology\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M20-0215 (Reapproved 0421)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M20-0215 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M20-1110 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M20-1104 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M20-0704 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M20-0998 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M20-92 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M20-91 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI M20-0215 (Reapproved 0421) - Current","offer_id":40234298703939,"sku":"14488","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M20-0215 - Superseded","offer_id":40234298802243,"sku":"4840","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M20-1110 - Superseded","offer_id":40234299031619,"sku":"9523","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M20-1104 - Superseded","offer_id":40234299162691,"sku":"9521","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI M20-0704 - Superseded","offer_id":40234299326531,"sku":"14489","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/MVolume_c106c02c-8004-4b4e-b0f7-4aefb59c6d72.png?v=1776702628","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/m02000-semi-m20-practice-for-establishing-a-wafer-coordinate-system","provider":"SEMI Dev 2","version":"1.0","type":"link"}