{"product_id":"f11500-semi-f115-test-method-for-the-determination-of-metallic-elements-present-on-wetted-surfaces-of-ultra-high-purity-chemical-delivery-systems-and-components","title":"F11500 - SEMI F115 - Test Method for the Determination of Metallic Elements Present on Wetted Surfaces of Ultra High Purity Chemical Delivery Systems and Components","description":"\u003cp class=\"StdsH2\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003eThis Document defines a test method for determining metallic elements present on the wetted surfaces of ultra high purity (UHP) chemical delivery systems and components.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsH1\"\u003e\u003cbr\u003e\u003c\/p\u003e\u003cp class=\"StdsH2\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003eThis Test Method is applicable to UHP chemical delivery systems and components. Examples of test samples include valves, regulators, filters, mass flow controllers, tubing, weld fittings, and face seal fittings.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsH2\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003e \u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsH2\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003eThis Test Method could also be used to determine the contamination contributed from an assembly or fabrication area.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsH2\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003e \u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsH2\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003eThis Document details the method to extract and measure ultrapure water (UPW) extractable metallic elements present on the wetted surfaces.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsH2\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003e \u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsH2\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003eThis Test Method could be used to evaluate the effectiveness of various flushing or purging processes.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsH2\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003e\u003cbr\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsH2\"\u003e\u003cb\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003eReferenced SEMI Standards\u003c\/font\u003e\u003c\/span\u003e\u003cspan style=\"font-size: small; font-family: Arial, sans-serif;\"\u003e \u003c\/span\u003e\u003c\/b\u003e\u003c\/p\u003e\u003cp class=\"StdsText\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003eSEMI E49.2 — Guide for the Qualification of Polymer Assemblies used for Liquid Chemicals Systems in Semiconductor Equipment\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsText\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003eSEMI E49.8 — Guide for High Purity and Ultrahigh Purity Gas Distribution Systems in Semiconductor Manufacturing Equipment\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsText\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003eSEMI F20 — Specification for 316L Stainless Steel Bar, Forgings, Extruded Shapes, Plate, and Tubing for Components Used in General Purpose, High Purity and Ultra-High Purity Semiconductor Manufacturing Applications\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsText\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003eSEMI F63 — Guide for Ultrapure Water Used in Semiconductor Processing\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style=\"line-height: 14.2667px; font-family: Arial, sans-serif;\"\u003e\u003cfont size=\"2\"\u003e \u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI F115-0220 - Current","offer_id":40234374201411,"sku":"13770","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/FVolume_aca58d1d-ae73-41df-9886-9987bfcf627f.png?v=1776701777","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/f11500-semi-f115-test-method-for-the-determination-of-metallic-elements-present-on-wetted-surfaces-of-ultra-high-purity-chemical-delivery-systems-and-components","provider":"SEMI Dev 2","version":"1.0","type":"link"}