{"product_id":"f07500-semi-f75-guide-for-quality-monitoring-of-ultrapure-water-used-in-semiconductor-manufacturing","title":"F07500 - SEMI F75 - Guide for Quality Monitoring of Ultrapure Water Used in Semiconductor Manufacturing","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide describes potential sources of contaminants,\ntheir impact on semiconductor manufacturing and available options for\nmonitoring these contaminants. This Guide should be used in conjunction with\nSEMI F61 and SEMI F63. Together these Guides provide recommendations for\nfacility engineers and other manufacturing and quality professionals who are\nresponsible for establishing programs to monitor and control the quality of\ntheir ultrapure water (UPW) systems, through to point of use (POU). These\nGuides may be used to help determine the parameters that should be monitored\nfor UPW that is produced, distributed, and used throughout the manufacturing\nfacility, and the frequency and location of testing.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eUPW is used extensively in the production of semiconductor\ndevices for all wet-processing steps. Ultrapure water systems need to be tested\nand monitored to ensure that the UPW being produced matches the specifications\nestablished by the manufacturing process. The purity of the UPW may affect\ndevice yield unless a wide range of parameters are closely controlled at the\npoint of distribution (POD). Semiconductor devices are currently being designed\nwith smaller linewidths (\u0026lt;65 nm) and are therefore more susceptible to low\nlevel impurities.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eUPW systems are monitored for continuous performance for\ndesired and achievable levels of quality. Action limits are generally set to\ndetermine when system performance data warrants that corrective action is\nneeded. Table 1, Parameters and Range of Performance, in SEMI F63 may be a\nuseful reference for establishing quality levels.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eIn more critical processes, the quality of the UPW also\nneeds to be monitored at the POU where the UPW is in contact with the wafer.\nThe quality of the UPW should not be expected to be identical to the quality of\nthe UPW being produced at final filter (FF), which is not subject to conditions\nwithin the tool or distribution system.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide is the third in a series of SEMI Standards developed\nfor UPW which include SEMI F61, a Standard defining the performance of a UPW\nsystem, and SEMI F63, a Standard defining the quality of UPW.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide provides information about the frequency and\nlocation of sampling for those parameters that are not available from online\nanalyzers. Frequency of sampling should be based on the specifications set by\nmanufacturing for the quality of the POD UPW, the number and locations of\nonline analyzers, the stability of the incoming feed water to the system, and the\nhistorical performance of the UPW system over time.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe Guides may also be used to establish process control\ncriteria for the incoming feedwater, performance of UPW system components and\nPOU rinse baths.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI F57 — Specification for Polymer Materials and\nComponents Used in Ultrapure Water and Liquid Chemical Distribution Systems\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI F61 — Guide for Design and Operation of a\nSemiconductor Ultrapure Water System\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI F63 — Guide for Ultrapure Water Used in Semiconductor\nProcessing\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI F104 — Test Method for Evaluation of Particle Contribution\nof Components Used in Ultrapure Water and Liquid Chemical Distribution Systems\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI F75-0221 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI F75-0617 (complete rewrite)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI F75-1102 (Reapproved 0309)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI F75-1102 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI F75-0521 - Current","offer_id":40234303520835,"sku":"14542","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI F75-0617 - Superseded","offer_id":40234303553603,"sku":"4078","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI F75-1102 (Reapproved 0309) - Superseded","offer_id":40234303750211,"sku":"10852","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI F75-1102 - Superseded","offer_id":40234303848515,"sku":"10825","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/FVolume_f3034381-1d98-48fa-8d30-ff0ab79c5bae.png?v=1776702722","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/f07500-semi-f75-guide-for-quality-monitoring-of-ultrapure-water-used-in-semiconductor-manufacturing","provider":"SEMI Dev 2","version":"1.0","type":"link"}