{"product_id":"f04600-semi-f46","title":"F04600 - SEMI F46 -","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis guide was technically approved by the global Facilities Committee and is the direct responsibility of the North American Facilities Committee. Current edition approved by the North American Regional Standards Committee on April 15, 1999. Initially available on www.semi.org August 1999; to be published September 1999.\u003c\/p\u003e\u003cfont size=\"2\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Arial\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis guide establishes the minimum System and Overall Implementation requirements for requirement of On-Site Chemical Generation (OSCG) used in semiconductor manufacturing. It is also intended to establish a common basis for developing detailed guides in subsequent documents concerning design, performance, and certification of OSCG systems.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis guide applies to the OSCG system design used for the generation of chemicals, particularly ultra high purity, used in the silicon wafer, integrated circuit, and\/or substrate manufacturing processes. These will include, but are not limited to, various concentrations of NH\u003csub\u003e4\u003c\/sub\u003eOH, HCl, HF, and NH\u003csub\u003e4\u003c\/sub\u003eF aqueous solutions.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\n\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003eSEMI S2 — Safety Guidelines for Semiconductor Manufacturing Equipment\u003c\/p\u003e\u003c\/font\u003e\u003c\/font\u003e","brand":"semi.org","offers":[{"title":"Default Title","offer_id":40234344677443,"sku":"","price":29700.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/FVolume_5025f63d-a455-4981-a65e-07075298c214.png?v=1776702244","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/f04600-semi-f46","provider":"SEMI Dev 2","version":"1.0","type":"link"}