{"product_id":"f04300-semi-f43-test-method-for-determination-of-particle-contribution-by-point-of-use-gas-purifiers-and-gas-filters","title":"F04300 - SEMI F43 - Test Method for Determination of Particle Contribution by Point-of-Use Gas Purifiers and Gas Filters","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on June 4, 2013. Available at www.semiviews.org and www.semi.org in June 2013. Originally published June 1999; previously published March 2008.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to define a method for testing POU purifiers and filters intended for installation into a high-purity gas distribution system and semiconductor manufacturing process equipment. Application of this test method is expected to yield comparable data among POU purifiers and filters tested for the purposes of qualification for its installation.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document describes a test method designed to draw comparisons of particulate generation performance of POU purifiers and filters tested under standard conditions. The procedure utilizes a condensation nucleus counter (CNC) applied to in-line gas filters and purifiers typically used in semiconductor applications. This test method applies to devices of various media and for room temperature operation. The purifier’s rated flow should be in the range of 0–50 standard liter per minute (slm). The flow rate for filters should be in the range 0–100 slm. If this method is to be used for higher flow rate devices, the testing parameters should be agreed upon by the manufacturer and the user.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe experimental set up described in this method can be used for testing POU purifiers and stand-alone POU filters.\u003c\/p\u003e\u003cfont size=\"2\"\u003e \u003cp\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfonthelv\u003e\u003cfonthelv\u003e \u003cp dir=\"ltr\"\u003e\u003cfont\u003eSEMI E49.8 — Guide for High Purity and Ultrahigh Purity Gas Distribution Systems in Semiconductor Manufacturing Equipment\u003cbr\u003e \u003cp dir=\"ltr\"\u003e\u003cfont\u003eSEMI F19 — Specification for the Surface Condition of the Wetted Surfaces of Stainless Steel Components\u003cbr\u003e \u003cp dir=\"ltr\"\u003e\u003cfont\u003eSEMI F70 — Test Method for Determination of Particle Contribution of Gas Delivery System\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/p\u003e\u003c\/fonthelv\u003e\u003c\/fonthelv\u003e\u003c\/p\u003e\u003c\/font\u003e","brand":"semi.org","offers":[{"title":"SEMI F43-0308 (Reapproved 0613) - Current","offer_id":40234266263619,"sku":"4044","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI F43-0308 - Superseded","offer_id":40234266460227,"sku":"10782","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI F43-0699 - Superseded","offer_id":40234266591299,"sku":"10783","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/FVolume_523c4cfb-15fd-46dd-80d7-ac874c873b44.png?v=1776702754","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/f04300-semi-f43-test-method-for-determination-of-particle-contribution-by-point-of-use-gas-purifiers-and-gas-filters","provider":"SEMI Dev 2","version":"1.0","type":"link"}