{"product_id":"f04000-semi-f42-practice-for-preparing-liquid-chemical-distribution-components-for-chemical-testing","title":"F04200 - SEMI F42 - Test Method for Semiconductor Processing Equipment Voltage Sag Immunity","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e\u003cb\u003eNOTICE:\u003c\/b\u003e This Document is no longer supported by the global technical committee. It has been replaced by SEMI F47.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e \u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThe purpose of this Document is to define the test method used to characterize the susceptibility of semiconductor processing, metrology, and automated test equipment to voltage sags.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Document defines the testing procedures and test equipment required to characterize the susceptibility of equipment to voltage sags by showing voltage sag duration and magnitude performance data for the equipment.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Test Method is intended for, but not limited to, the following equipment types:\u003c\/font\u003e\u003c\/p\u003e \u003cul\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cli\u003e\u003cfont face=\"arial\" size=\"2\"\u003eEtch equipment (Dry and Wet)\u003c\/font\u003e\u003c\/li\u003e \u003cp\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cli\u003e\u003cfont face=\"arial\" size=\"2\"\u003eFilm deposition equipment (CVD and PVD)\u003c\/font\u003e\u003c\/li\u003e \u003cp\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cli\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThermal equipment \u003c\/font\u003e\u003c\/li\u003e \u003cp\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cli\u003e\u003cfont face=\"arial\" size=\"2\"\u003eSurface prep and clean\u003c\/font\u003e\u003c\/li\u003e \u003cp\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cli\u003e\u003cfont face=\"arial\" size=\"2\"\u003ePhotolithography equipment (Stepper and Tracks)\u003c\/font\u003e\u003c\/li\u003e \u003cp\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cli\u003e\u003cfont face=\"arial\" size=\"2\"\u003eChemical Mechanical Polishing equipment\u003c\/font\u003e\u003c\/li\u003e \u003cp\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cli\u003e\u003cfont face=\"arial\" size=\"2\"\u003eIon Implant equipment\u003c\/font\u003e\u003c\/li\u003e \u003cp\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cli\u003e\u003cfont face=\"arial\" size=\"2\"\u003eMetrology equipment\u003c\/font\u003e\u003c\/li\u003e \u003cp\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\n\u003cli\u003e\u003cfont face=\"arial\" size=\"2\"\u003eAutomated test equipment\u003c\/font\u003e\u003c\/li\u003e \u003cp\u003e\u003c\/p\u003e\n\u003c\/ul\u003e\u003cfont size=\"2\"\u003e\u003cfont face=\"arial\"\u003e \u003c\/font\u003e\u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\"\u003e　\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont face=\"arial\"\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003c\/font\u003e\u003cp\u003e\u003cfont\u003e\u003cfont face=\"arial\"\u003eNone.\u003c\/font\u003e\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e\u003c\/font\u003e","brand":"semi.org","offers":[{"title":"SEMI F42-0200 - Replaced","offer_id":40234355392579,"sku":"10953","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/FVolume_a870c53f-0979-4191-be6a-d69ec21dc0ef.png?v=1776701998","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/f04000-semi-f42-practice-for-preparing-liquid-chemical-distribution-components-for-chemical-testing","provider":"SEMI Dev 2","version":"1.0","type":"link"}