{"product_id":"e18000-semi-e180-test-method-for-measuring-surface-metal-contamination-through-icp-ms-of-critical-chamber-components-used-in-semiconductor-wafer-processing","title":"E18000 - SEMI E180 - Test Method for Measuring Surface Metal Contamination Through ICP-MS of Critical Chamber Components Used in Semiconductor Wafer Processing","description":"\u003cp class=\"StdsH2\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eThis Document describes a method for a quantitative \n \n analysis for surface trace-metal concentration of critical chamber components (CCCs) by using inductively coupled plasma-mass \n \n spectrometry (ICP-MS). This Standard is intended to promote communication \n \n between the users and the processing-equipment suppliers. It can be also used \n \n to facilitate better communication regarding surface metal-contamination \n \n expectation and its test method between the processing equipment suppliers and \n \n the CCC manufacturers.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eThis Document describes the procedure for trace-metal \n \n measurement, including the surface trace-metal collection from a CCC, as it \n \n influences the reliability of measurement data and reproducibility of each test \n \n facility.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eThe use of this Document is to ensure consistency in the \n \n reporting of results provided by each processing-equipment supplier or CCC \n \n manufacturer.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eThis Document applies to the measurement of surface \n \n trace-metal concentration of CCCs (e.g., showerheads, pedestals) by ICP-MS.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eThis Document applies to an unused CCC or its parts.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eThis Document covers local extraction and full-immersion \n \n trace-metal collection techniques.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eThe objective metals in this measurement are aluminum (Al), \n \n sodium (Na), potassium (K), calcium (Ca), lithium (Li), iron (Fe), copper (Cu), \n \n nickel (Ni), chromium (Cr), cobalt (Co), titanium (Ti), magnesium (Mg), and \n \n zinc (Zn).\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI C10 — Guide for Determination of Method Detection \n \n Limits\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI C16 — Guide for Precision and Data Reporting Practices\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI F63 — Guide for Ultrapure Water Used in Semiconductor \n \n Processing\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI E180-1220 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003eSEMI E180-1219 (first published)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cbr\u003e","brand":"semi.org","offers":[{"title":"SEMI E180-1220 - Current","offer_id":40234368925763,"sku":"14359","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E180-1219 - Superseded","offer_id":40234368958531,"sku":"13666","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/EVolume_02880b14-6210-4273-b575-64bd3c47377f.png?v=1776701792","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/e18000-semi-e180-test-method-for-measuring-surface-metal-contamination-through-icp-ms-of-critical-chamber-components-used-in-semiconductor-wafer-processing","provider":"SEMI Dev 2","version":"1.0","type":"link"}