{"product_id":"e12900-semi-e129-guide-to-assess-and-control-electrostatic-charge-in-a-semiconductor-manufacturing-facility","title":"E12900 - SEMI E129 - Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing Facility","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cbr\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe purpose of this Guide is to minimize the negative\nimpact on productivity caused by static charge and electric fields in\nsemiconductor manufacturing environments. It is a guide for establishing\nelectrostatic compatibility in facilities used for semiconductor manufacturing.\nElectrostatic compatibility of production equipment is addressed in\nSEMI E78.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eElectrostatic surface charge causes a number of undesirable\neffects in semiconductor manufacturing environments.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003c\/p\u003e\u003cul\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eElectrostatic discharge (ESD) damages both products and\nreticles. ESD events also cause electromagnetic interference (EMI), resulting\nin equipment malfunctions.\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eCharged wafer and reticle surfaces attract airborne\nparticles (electrostatic attraction [ESA]) and increase the defect rate. Charge\non products can also result in equipment malfunction or product breakage.\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eOperating problems and additional product defects due to\nstatic charge can have a negative impact on the cost of ownership (COO) of\nsemiconductor manufacturing equipment (refer to SEMI E35).\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\n\n\n\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eStatic-control methods can be incorporated in the factory\ndesign to reduce static charge to acceptable levels. This Guide can be used as\na guide by semiconductor manufacturers and cleanroom facilities designers\nduring the design of their facilities. Producers and users of the silicon\nwafers and reticles used in semiconductor manufacturing will also find it\nuseful. The test methods described can be used to demonstrate the effectiveness\nof the static control methods. The end user will be able to use these test\nmethods to verify compliance with a facility design specification after the\nfacility is built or after design changes have been made, and to verify ongoing\ncompliance as a part of factory maintenance procedures.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSemiconductor process technology continues to move toward\nsmaller product geometries. Acceptable static charge levels continue to\ndecrease with product feature size. This Guide provides recommendations to help\nassure that facility static charge limits are appropriate for the product being\nmanufactured, referencing the feature sizes contained in the International\nRoadmap for Devices and SystemsTM (IRDSTM).\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe scope of this Guide is limited to providing recommended\nmethods of measurement and guidance for the maximum recommended level of static\ncharge on all facility surfaces including:\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003c\/p\u003e\u003cul\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eProduct, reticles, or their carriers;\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eFacility construction materials and furniture;\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003ePersonnel;\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003ePackaging and transport materials; and\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eEquipment (through reference to SEMI E78).\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\n\n\n\n\n\n\n\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide presents a table of maximum recommended levels\nof static charge on products, reticles, carriers, and surfaces within the\nsemiconductor production facility. The purpose is to:\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003c\/p\u003e\u003cul\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eReduce product, reticle, and equipment damage due to ESD;\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eReduce equipment lock-up problems due to ESD events; and\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eReduce the attraction of particles to charged surfaces.\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\n\n\n\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide references SEMI E78, SEMI E43, and other methods\nof measuring static charge as well as the performance parameters of\nstatic-control methods.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards \u003c\/b\u003e(purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E33 — Guide for Semiconductor Manufacturing Facility\nElectromagnetic Compatibility\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E35 — Guide to Calculate Cost of Ownership (COO)\nMetrics for Semiconductor Manufacturing Equipment\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E43 — Guide for Electrostatic Measurements on Objects\nand Surfaces\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E78 — Guide to Assess and Control Electrostatic\nDischarge (ESD) and Electrostatic Attraction (ESA) for Equipment\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E163 — Guide for the Handling of Reticles and Other\nExtremely Electrostatic Sensitive (EES) Items Within Specially Designated Areas\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E129-0222 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E129-0912 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E129-0709 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E129-0706 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E129-1103 (first published)\u003cbr\u003e\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI E129-0222 - 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