{"product_id":"e11300-semi-e113-specification-for-semiconductor-processing-equipment-rf-power-delivery-systems","title":"E11300 - SEMI E113 - Specification for Semiconductor Processing Equipment RF Power Delivery Systems","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eNOTICE: \u003c\/strong\u003eThis Standard was completely rewritten in 2024.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e1  Purpose\u003cbr\u003e1.1  It is the intent of this Standard to provide radio frequency (RF) power-delivery system specifications for semiconductor processing equipment that leads to improved system and subsystem performance. It outlines performance criteria as well as required documentation to be supplied with the RF power-delivery systems or subsystem components. The goal of the Standard is to provide the specifications needed to produce a well-characterized RF power-delivery system, where stability, repeatability, and important electrical parameters such as delivered power, current\/voltage, and the impedance of the system can be determined within the operating space.\u003cbr\u003e2  Scope\u003cbr\u003e2.1  This Standard specifies the minimum performance criteria for RF power-delivery systems used in the semiconductor industry. It does not address specific test methods or procedures for performance verification.\u003cbr\u003e2.2  The primary focus for this Standard is an RF power-delivery system that is incorporated into semiconductor processing equipment including, but not limited to, the following equipment types:\u003cbr\u003e• Dry etch equipment, and\u003cbr\u003e• Film deposition equipment (chemical vapor deposition [CVD] and physical vapor deposition [PVD]).\u003cbr\u003e2.3  This Standard applies to semiconductor processing equipment RF power-delivery systems whose power is directly used to produce and sustain the plasma or is electrically connected to the plasma (i.e., bias power).\u003cbr\u003e2.4  Although the primary focus of this Standard is RF power-delivery systems used in the semiconductor processing equipment, this Standard can be applied to RF power deliver systems used in similar processing equipment for other high-tech industries (e.g., flat panel display [FPD], high-brightness light emitting diode [HB-LED], microelectromechanical systems\/nanoelectromechanical systems [MEMS\/NEMS]).\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI E10 — Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and Utilization\u003cbr\u003eSEMI E33 — Guide for Semiconductor Manufacturing Equipment Electromagnetic Compatibility (EMC)\u003cbr\u003eSEMI E89 — Guide for Measurement System Analysis (MSA)\u003cbr\u003eSEMI E114 — Test Method for RF Cable Assemblies Used in Semiconductor Processing Equipment RF Power Delivery Systems\u003cbr\u003eSEMI E115 — Test Method for Determining the Load Impedance and Efficiency of Matching Networks Used in Semiconductor Processing Equipment RF Power Delivery Systems\u003cbr\u003eSEMI E135 — Test Method for RF Generators to Determine Transient Response for RF Power Delivery Systems used in Semiconductor Processing Equipment\u003cbr\u003eSEMI E136 — Test Method for Determining the Output Power of RF Generators Used in Semiconductor Processing Equipment RF Power Delivery Systems\u003cbr\u003eSEMI E143 — Test Method for Measuring Power Variation into a 50 Ω Load and Power Variation and Spectrum into a Load with a VSWR of 2.0 at Any Phase Angle\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI E113-0724 (complete rewrite)\u003cbr\u003eSEMI E113-0306 (Reapproved 0518)\u003cbr\u003eSEMI E113-0306 (Reapproved 0512)\u003cbr\u003eSEMI E113-0306 (technical revision)\u003cbr\u003eSEMI E113-1104 (technical revision)\u003cbr\u003eSEMI E113-1103 (technical revision)\u003cbr\u003eSEMI E113-1102 (technical revision)\u003cbr\u003eSEMI E113-1101 (first published)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI E113-0724 - Current","offer_id":43106904506435,"sku":"17867","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E113-0306 (Reapproved 0518) - Superseded","offer_id":43106904539203,"sku":"3729","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E113-0306 (Reapproved 0512) - Superseded","offer_id":40234251518019,"sku":"7689","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E113-0306 - Superseded","offer_id":40234251550787,"sku":"7190","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E113-1104 - Superseded","offer_id":40234251583555,"sku":"7191","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/EVolume_bf105189-c104-4d26-bfe6-301ec892dd54.png?v=1776702893","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/e11300-semi-e113-specification-for-semiconductor-processing-equipment-rf-power-delivery-systems","provider":"SEMI Dev 2","version":"1.0","type":"link"}