{"product_id":"e10400-semi-e104-specification-for-integration-and-guideline-for-calibration-of-low-pressure-particle-monitor","title":"E10400 - SEMI E104 - Specification for Integration and Guideline for Calibration of Low-pressure Particle Monitor","description":"\u003cfont face=\"Arial\"\u003e\u003cfont face=\"Arial\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cspan style='font-family: \"Microsoft Sans Serif\"; font-size: small;'\u003eNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.\u003c\/span\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont face=\"Arial\"\u003e\u003cfont face=\"Arial\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e　\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eThe use of in situ particle monitoring (ISPM; particle measurements performed while the wafer resides inside the processing chamber) in low-pressure and vacuum applications provides a number of advantages for defect, process, and equipment management such as:\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cul\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003c\/font\u003e\u003c\/p\u003e\n\u003cli\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eReduction of particle test wafers used for off-line tests and saving operator time,\u003c\/font\u003e\u003c\/font\u003e\u003c\/li\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003c\/font\u003e\u003c\/p\u003e\n\u003cli\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eOptimization and real-time characterization of the process,\u003c\/font\u003e\u003c\/font\u003e\u003c\/li\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003c\/font\u003e\u003c\/p\u003e\n\u003cli\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eAdvanced process control,\u003c\/font\u003e\u003c\/font\u003e\u003c\/li\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003c\/font\u003e\u003c\/p\u003e\n\u003cli\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eAdvanced equipment control,\u003c\/font\u003e\u003c\/font\u003e\u003c\/li\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003c\/font\u003e\u003c\/p\u003e\n\u003cli\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eMonitoring process chamber conditions, and\u003c\/font\u003e\u003c\/font\u003e\u003c\/li\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003c\/font\u003e\u003c\/p\u003e\n\u003cli\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eOptimization of cleaning procedures and maintenance.\u003c\/font\u003e\u003c\/font\u003e\u003c\/li\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003c\/font\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\n\u003c\/ul\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eTherefore, ISPM achieves more equipment availability and faster ramp-up of the production, reduces cost of ownership, improves quality and yield. To reach these goals, ISPM needs to be easily integrated into new or existing process equipment and the acquisition as well as the analysis of the particle data needs to be automated. The ISPM sensor should not have any negative influence on the process and the measurement has to represent the main particle flow. The sensor should be designed to have a minimum negative impact on the parameters defined in SEMI　E10 for the whole semiconductor process equipment, to achieve an advantage in capacity.\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e　\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eThis Standard is intended to stipulate operating conditions, mechanical, electrical, and communication interfaces for the use of low-pressure particle detectors integrated in semiconductor process equipment. A guideline for a reference calibration of those sensors is intended to support correlation between measurements with different sensors.\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eThis Standard applies to particle measurement under low-pressure and vacuum conditions in semiconductor manufacturing equipment.\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\"\u003e\u003c\/font\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\"\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp class=\"StdsText\" style=\"\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003eSEMI C6.5 — Particle Specification for Grade 10\/0.2 Nitrogen (N\u003csub style=\"\"\u003e2\u003c\/sub\u003e) and Argon (Ar) Delivered as Pipeline Gas\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003eSEMI C6.6 — Particle Specification for Grade 10\/0.1 Nitrogen (N\u003csub\u003e2\u003c\/sub\u003e) and Argon (Ar) Delivered as Pipeline Gas\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003eSEMI E4 — SEMI Equipment Communications Standard 1 Message Transfer (SECS-I)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003eSEMI E5 — SEMI Equipment Communications Standard 2 Message Content (SECS-II)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003eSEMI E10 — Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and Utilization\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003eSEMI E33 — Guide for Semiconductor Manufacturing Equipment Electromagnetic Compatibility (EMC)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003eSEMI E37 — High-Speed SECS Message Services (HSMS) Generic Services\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003eSEMI E54 — Specification for Sensor\/Actuator Network\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003eSEMI E54.10 — Specification for Sensor\/Actuator Network Specific Device Model for an In-Situ Particle Monitor Device\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp class=\"StdsText\" style=\"\"\u003e\u003cspan style=\"font-family: Arial, sans-serif;\"\u003eSEMI F6 — Guide for Secondary Containment of Hazardous Gas Piping Systems\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp class=\"MsoNormal\" style=\"\"\u003e\u003cspan style=\"line-height: 14.2667px; font-family: Arial, sans-serif;\"\u003e\u003co:p style=\"\"\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e","brand":"semi.org","offers":[{"title":"SEMI E104-0303 (Reapproved 0211) - Inactive","offer_id":40234330882115,"sku":"5840","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E104-0303 - Superseded","offer_id":40234331177027,"sku":"7178","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/EVolume_26feb69a-c2b3-4fb2-84d2-4efcc6c163bf.png?v=1776702338","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/e10400-semi-e104-specification-for-integration-and-guideline-for-calibration-of-low-pressure-particle-monitor","provider":"SEMI Dev 2","version":"1.0","type":"link"}