{"product_id":"e07800-semi-e78-guide-to-assess-and-control-electrostatic-discharge-esd-and-electrostatic-attraction-esa-for-equipment","title":"E07800 - SEMI E78 - Guide to Assess and Control Electrostatic Discharge (ESD) and Electrostatic Attraction (ESA) for Equipment","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cbr\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe purpose of this Guide is to minimize the negative\nimpact on productivity caused by static charge and electric fields in\nsemiconductor manufacturing equipment. It is a guide for establishing\nelectrostatic compatibility of equipment used in semiconductor manufacturing.\nElectrostatic compatibility in the entire semiconductor factory is addressed in\nSEMI E129.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eElectrostatic surface charge causes a number of undesirable\neffects in semiconductor manufacturing environments.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003c\/p\u003e\u003cul\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eElectrostatic discharge (ESD) damages both products and\nreticles. ESD events also cause electromagnetic interference (EMI), resulting\nin equipment malfunctions.\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eCharged wafer and reticle surfaces attract particles\n(electrostatic attraction [ESA]) and increase the defect rate. Charge on\nproducts can also result in equipment malfunction or product breakage.\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eOperating problems and additional product defects due to\nstatic charge can have a negative impact on the cost of ownership (COO) of\nsemiconductor manufacturing equipment (refer to SEMI E35).\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\n\n\n\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Standard can be used as a guide for equipment\nmanufacturers during the design and testing of their equipment. The test\nmethods described can also be used by semiconductor manufacturers to check the\nperformance of equipment and to verify its conformance with procurement\nspecifications.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSemiconductor process technology continues to move toward\nsmaller product geometries. Acceptable static charge levels continue to decrease\nwith product feature size. This Guide provides recommendations for equipment\nstatic charge limits that are appropriate for the product being manufactured,\nreferencing the feature sizes contained in the International Roadmap for\nDevices and Systems (IRDS).\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe scope of this Guide is limited to providing recommended\nmethods of measurement and guidance for the maximum recommended level of static\ncharge on:\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003c\/p\u003e\u003cul\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eProduct or reticles,\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eCarriers, and\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eParts of the input\/exit ports of equipment and\nminienvironments.\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\n\n\n\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cbr\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide presents a table of maximum recommended levels\nof static charge on products, reticles, carriers, and the input and exit ports\nof production equipment or minienvironments. The purpose is to:\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003c\/p\u003e\u003cul\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eReduce product, reticle, and equipment damage due to ESD;\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eReduce equipment lock-up problems due to ESD events; and\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eReduce the attraction of particles to charged surfaces.\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\n\n\n\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide references SEMI E43 and other methods of\nmeasuring static charge.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E33 — Guide for Semiconductor Manufacturing Equipment\nElectromagnetic Compatibility (EMC)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E35 — Guide to Calculate Cost of Ownership (COO)\nMetrics for Semiconductor Manufacturing Equipment\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E43 — Guide for Electrostatic Measurements on Objects\nand Surfaces\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E129 — Guide to Assess and Control Electrostatic\nCharge in a Semiconductor Manufacturing Facility\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E163 — Guide for the Handling of Reticles and Other\nExtremely Electrostatic Sensitive (EES) Items Within Specially Designated Areas\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E78-0222 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E78-0912 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E78-0309 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E78-0708 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E78-0706 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E78-1105 (complete rewrite)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E78-1102 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E78-0998 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI E78-0222 - Current","offer_id":40234253975619,"sku":"14892","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E78-0912 - Superseded","offer_id":40234254008387,"sku":"3854","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E78-0309 - Superseded","offer_id":40234254041155,"sku":"7485","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E78-0708 - Superseded","offer_id":40234254073923,"sku":"7407","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E78-0706 - Superseded","offer_id":40234254106691,"sku":"7406","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E78-1105 - Superseded","offer_id":40234254139459,"sku":"7409","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E78-1102 - Superseded","offer_id":40234254172227,"sku":"7408","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E78-0998 - Superseded","offer_id":40234254204995,"sku":"7481","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/EVolume_61223479-fc2d-4fbc-9cc8-2b8abcad1690.png?v=1776702791","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/e07800-semi-e78-guide-to-assess-and-control-electrostatic-discharge-esd-and-electrostatic-attraction-esa-for-equipment","provider":"SEMI Dev 2","version":"1.0","type":"link"}