{"product_id":"e04500-semi-e45-test-method-for-the-determination-of-inorganic-contamination-from-minienvironments-using-vpd-txrf-vpd-aas-or-vpd-icp-ms","title":"E04500 - SEMI E45 - Test Method for the Determination of Inorganic Contamination from Minienvironments Using VPD-TXRF, VPD-AAS, or VPD\/ICP-MS","description":"\u003cp class=\"StdsHead1\" style=\"text-align: justify; break-after: auto;\"\u003e\u003cbr\u003e\u003c\/p\u003e\u003cp class=\"StdsHead1\" style=\"text-align: justify; break-after: auto;\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eNOTICE:\u003c\/b\u003e This Standard or Safety Guideline has Inactive\nStatus because the conditions to maintain Current Status have not been met.\nInactive Standards or Safety Guidelines are available from SEMI and continue to\nbe valid for use.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Test Method provides the analytical procedures to\ndetermine the level of inorganic contamination from a minienvironment.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Document relates to inorganic impurities, which\nincludes metallic contaminants, whether they occur as atoms, molecules, or particles.\nThe number of metals to be analyzed is restricted to the four elements sodium (Na),\ncalcium (Ca), iron (Fe), and copper (Cu) in order to rapidly characterize\nmini-environments from a practicable point of view. While Na, Ca, and Fe\nrepresent one ensemble of highly detrimental impurities with respect to\ncontamination from human sources (Na), the environment (Ca), or from equipment\nand corrosive effects (Fe), Cu is analyzed due to its increasing importance in\nsemiconductor manufacturing. Additionally, they are easily analyzed with\nsufficiently low detection limits. It is up to the user of this test method to\nquantify additional elements. A list of suggested polished wafer surface metal\ncontamination inappropriate to circuits and devices is shown in Table 1 (based\non SEMI M1). The inorganic contamination on silicon wafer surfaces is collected\nby VPD.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eTo quantify Ca and Fe, VPD\/TXRF is used due to its\nsufficiently low detection limits. Na and Cu are quantified by VPD\/GFAAS or\nVPD\/ICP-MS. All analytical methods are widely used for the characterization of\nsurface cleanliness.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis measurement technique can also be used to check the\ninfluence of certain process steps on minienvironments.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C28 — Specifications for Hydrofluoric Acid\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C35 — Specifications and Guide for Nitric Acid\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E19 — Specification for Standard Mechanical Interface\n(SMIF)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M1 — Specification for Polished Monocrystalline\nSilicon Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E45-1101 (Reapproved 0307)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E45-1101 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E45-0301 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E45-1000 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E45-95 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI E45-1101 (Reapproved 0307) - Inactive","offer_id":40234350510147,"sku":"6064","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI E45-1101 - Superseded","offer_id":40234350542915,"sku":"7468","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/EVolume_bac885de-920d-4a8a-832f-dd903fb7ebf3.png?v=1776702210","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/e04500-semi-e45-test-method-for-the-determination-of-inorganic-contamination-from-minienvironments-using-vpd-txrf-vpd-aas-or-vpd-icp-ms","provider":"SEMI Dev 2","version":"1.0","type":"link"}