{"product_id":"c09800-semi-c98-guide-for-chemical-mechanical-planarization-cmp-particle-size-distribution-psd-measurement-and-reporting-used-in-semiconductor-manufacturing","title":"C09800 - SEMI C98 - Guide for Chemical Mechanical Planarization (CMP) Particle Size Distribution (PSD) Measurement and Reporting Used in Semiconductor Manufacturing","description":"\u003cp class=\"StdsH2\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003e\u003cfont size=\"2\"\u003eThe \n \n purpose of this Document is to provide a guide for the measurement of and reporting \n \n of particle size distributions (PSD) for chemical mechanical planarization (CMP) \n \n slurries. Most CMP slurries have a wide range of particle sizes from a few nanometers \n \n to several hundreds of nanometers. This Guide does not define which measurement \n \n technique should be used but focuses on the parameters to report on a \n \n Certificate of Analysis (CoA) and on the roadmap for the development of new \n \n semiconductor technologies. Reference to this Guide can be used in the \n \n corresponding CoA from a CMP supplier to its customers.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"StdsH1\"\u003e\u003cbr\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"StdsH2\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003e\u003cfont size=\"2\"\u003eThis \n \n Document provides guidance on how CMP PSD should be reported on a CoA.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"StdsH2\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003e\u003cfont size=\"2\"\u003e \u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"StdsH2\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003e\u003cfont size=\"2\"\u003eThe \n \n Related Information section provides extensive background information on \n \n several topics:\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"Bullet1\"\u003e\u003c!--[if !supportLists]--\u003e\u003cfont size=\"2\"\u003e\u003cspan style=\"font-family:Symbol;mso-fareast-font-family:Symbol;mso-bidi-font-family: \n \n Symbol\"\u003e·\u003cspan style='font-variant-numeric: normal; font-variant-east-asian: normal; font-stretch: normal; line-height: normal; font-family: \"Times New Roman\";'\u003e \n \n \u003c\/span\u003e\u003c\/span\u003e\u003c!--[endif]--\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eWhat \n \n a full CoA for CMP slurries should contain (not just PSD).\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/font\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"Bullet1\"\u003e\u003c!--[if !supportLists]--\u003e\u003cfont size=\"2\"\u003e\u003cspan style=\"font-family:Symbol;mso-fareast-font-family:Symbol;mso-bidi-font-family: \n \n Symbol\"\u003e·\u003cspan style='font-variant-numeric: normal; font-variant-east-asian: normal; font-stretch: normal; line-height: normal; font-family: \"Times New Roman\";'\u003e \n \n \u003c\/span\u003e\u003c\/span\u003e\u003c!--[endif]--\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eThe \n \n fundamentals for measuring any PSD with specific references to what should be \n \n reported for CMP slurries.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/font\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"Bullet1\"\u003e\u003c!--[if !supportLists]--\u003e\u003cfont size=\"2\"\u003e\u003cspan style=\"font-family:Symbol;mso-fareast-font-family:Symbol;mso-bidi-font-family: \n \n Symbol\"\u003e·\u003cspan style='font-variant-numeric: normal; font-variant-east-asian: normal; font-stretch: normal; line-height: normal; font-family: \"Times New Roman\";'\u003e \n \n \u003c\/span\u003e\u003c\/span\u003e\u003c!--[endif]--\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eCMP \n \n sample preparation.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/font\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"Bullet1\"\u003e\u003c!--[if !supportLists]--\u003e\u003cfont size=\"2\"\u003e\u003cspan style=\"font-family:Symbol;mso-fareast-font-family:Symbol;mso-bidi-font-family: \n \n Symbol\"\u003e·\u003cspan style='font-variant-numeric: normal; font-variant-east-asian: normal; font-stretch: normal; line-height: normal; font-family: \"Times New Roman\";'\u003e \n \n \u003c\/span\u003e\u003c\/span\u003e\u003c!--[endif]--\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eDetails \n \n for four CMP PSD measurement techniques together with the advantages and \n \n disadvantages of each technique.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/font\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"StdsText\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003e\u003cfont size=\"2\"\u003e \u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"StdsText\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003e\u003cfont size=\"2\"\u003eReferenced SEMI Standards\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"StdsText\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003e\u003cfont size=\"2\"\u003eSEMI C96 — Test Method for Determining Density of Chemical Mechanical Polish \n \n (CMP) Slurries\u003co:p\u003e\u003c\/o:p\u003e\u003c\/font\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"Body\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003e\u003cfont size=\"2\"\u003eSEMI F63 — Guide for \n \n Ultrapure Water used in Semiconductor Processing\u003c\/font\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e \n \n  \n \n \u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family: \n \n \"Arial\",sans-serif'\u003e \u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C98-1219 - Current","offer_id":40234373644355,"sku":"13668","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/CVolume_pc_9c7867a8-d6a9-45cc-8b5a-f8c1241ee9a8.png?v=1776701791","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/c09800-semi-c98-guide-for-chemical-mechanical-planarization-cmp-particle-size-distribution-psd-measurement-and-reporting-used-in-semiconductor-manufacturing","provider":"SEMI Dev 2","version":"1.0","type":"link"}