{"product_id":"c07800-semi-c78-test-method-for-determining-roughness-of-polymer-surfaces-used-in-ultrapure-water-and-liquid-chemical-distribution-systems-by-atomic-force-microscopy","title":"C07800 - SEMI C78 - Test Method for Determining Roughness of Polymer Surfaces Used in Ultrapure Water and Liquid Chemical Distribution Systems by Atomic Force Microscopy","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Liquid Chemicals Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on August 17, 2018. Available at www.semiviews.org and www.semi.org in December 2018; originally published January 2013.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eNOTICE: This Document was reapproved with minor editorial changes.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document provides a test method for determining the roughness of polymer surfaces using atomic force microscopy (AFM) in intermittent contact mode.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eIn microelectronics, the need to accurately determine roughness of polymer surfaces is important when evaluating fluid handling system components from various sources. Rough surfaces have been known to contribute to the shedding of particles, encourage the harboring of micro contamination and promote the proliferation of bacteria. This method can also be used for other applications outside of microelectronics.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe use of AFM for measuring the roughness of polymer surfaces is outlined in this test method. AFM uses a stylus or probe tip that interacts with the surface of interest and moves at a known speed across the surface while recording the up and down movement of the tip relative to the surface, to image the sample topography.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eValues of the image obtained using this method are reported in Ra, arithmetic mean deviation of the assessed profile and Rq, root mean square deviation of the assessed profiles in nanometers. Additionally, the sum of the peak height Zp and the valley depth Zv are reported.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003c\/p\u003e\u003cp align=\"left\"\u003e\u003cfont\u003eNone.\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C78-0113 (Reapproved 1218) - Current","offer_id":40234232873027,"sku":"2181","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI C78-0113 - Superseded","offer_id":40234233069635,"sku":"11958","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/CVolume_pc_323cde85-814a-4018-8655-00ea5b718abb.png?v=1776703066","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/c07800-semi-c78-test-method-for-determining-roughness-of-polymer-surfaces-used-in-ultrapure-water-and-liquid-chemical-distribution-systems-by-atomic-force-microscopy","provider":"SEMI Dev 2","version":"1.0","type":"link"}