{"product_id":"c06500-semi-c65-guide-for-trimethylsilane-3ms-99-995-quality","title":"C06500 - SEMI C65 - Guide for Trimethylsilane (3MS), 99.995% Quality","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Liquid Chemicals Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 8, 2016. Available at www.semiviews.org and www.semi.org in March 2017; originally published February 2008.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide a guide for trimethylsilane (3MS) used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document covers guides for 3MS used in the semiconductor industry for plasma enhanced chemical vapor deposition (PECVD) as low k dielectric and as a SiC etch stop, hard mask and copper diffusion barrier precursor.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eNone.\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C65-0317 - Inactive","offer_id":43106909749315,"sku":"2167","price":31900.0,"currency_code":"JPY","in_stock":true},{"title":"SEMI C65-0308 - Superseded","offer_id":40234229334083,"sku":"11941","price":31900.0,"currency_code":"JPY","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0567\/3402\/3747\/files\/CVolume_pc_e1aba5e9-6ef7-40ee-890c-859656bb7e85.png?v=1776703076","url":"https:\/\/store-dev2.semi.org\/en-jp\/products\/c06500-semi-c65-guide-for-trimethylsilane-3ms-99-995-quality","provider":"SEMI Dev 2","version":"1.0","type":"link"}